SUBMICRON PARTICLE REMOVAL FROM GAS STREAMS

Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing l...

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Hauptverfasser: HIGGINS, Brian Sayre, YATES, Robert Arthur, DIRKX, Wilfried Marc Renaat, TATE III, John Marshall, HEON, Jon Michael, POMERLEAU, Marcel Julien, COLOMA GONZÁLEZ, Juan
Format: Patent
Sprache:eng ; fre ; ger
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