SUBMICRON PARTICLE REMOVAL FROM GAS STREAMS
Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing l...
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| creator | HIGGINS, Brian Sayre YATES, Robert Arthur DIRKX, Wilfried Marc Renaat TATE III, John Marshall HEON, Jon Michael POMERLEAU, Marcel Julien COLOMA GONZÁLEZ, Juan |
| description | Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h). |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP3454971B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP3454971B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP3454971B13</originalsourceid><addsrcrecordid>eNrjZNAODnXy9XQO8vdTCHAMCvF09nFVCHL19Q9z9FFwC_L3VXB3DFYIDglydfQN5mFgTUvMKU7lhdLcDApuriHOHrqpBfnxqcUFicmpeakl8a4BxiamJpbmhk6GxkQoAQA7DSSo</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SUBMICRON PARTICLE REMOVAL FROM GAS STREAMS</title><source>esp@cenet</source><creator>HIGGINS, Brian Sayre ; YATES, Robert Arthur ; DIRKX, Wilfried Marc Renaat ; TATE III, John Marshall ; HEON, Jon Michael ; POMERLEAU, Marcel Julien ; COLOMA GONZÁLEZ, Juan</creator><creatorcontrib>HIGGINS, Brian Sayre ; YATES, Robert Arthur ; DIRKX, Wilfried Marc Renaat ; TATE III, John Marshall ; HEON, Jon Michael ; POMERLEAU, Marcel Julien ; COLOMA GONZÁLEZ, Juan</creatorcontrib><description>Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h).</description><language>eng ; fre ; ger</language><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS ; CHEMISTRY ; FERTILISERS ; MANUFACTURE THEREOF ; METALLURGY ; NITROGENOUS FERTILISERS ; ORGANIC CHEMISTRY ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; SEPARATION ; TRANSPORTING</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200715&DB=EPODOC&CC=EP&NR=3454971B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76418</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200715&DB=EPODOC&CC=EP&NR=3454971B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HIGGINS, Brian Sayre</creatorcontrib><creatorcontrib>YATES, Robert Arthur</creatorcontrib><creatorcontrib>DIRKX, Wilfried Marc Renaat</creatorcontrib><creatorcontrib>TATE III, John Marshall</creatorcontrib><creatorcontrib>HEON, Jon Michael</creatorcontrib><creatorcontrib>POMERLEAU, Marcel Julien</creatorcontrib><creatorcontrib>COLOMA GONZÁLEZ, Juan</creatorcontrib><title>SUBMICRON PARTICLE REMOVAL FROM GAS STREAMS</title><description>Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h).</description><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS</subject><subject>CHEMISTRY</subject><subject>FERTILISERS</subject><subject>MANUFACTURE THEREOF</subject><subject>METALLURGY</subject><subject>NITROGENOUS FERTILISERS</subject><subject>ORGANIC CHEMISTRY</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>SEPARATION</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAODnXy9XQO8vdTCHAMCvF09nFVCHL19Q9z9FFwC_L3VXB3DFYIDglydfQN5mFgTUvMKU7lhdLcDApuriHOHrqpBfnxqcUFicmpeakl8a4BxiamJpbmhk6GxkQoAQA7DSSo</recordid><startdate>20200715</startdate><enddate>20200715</enddate><creator>HIGGINS, Brian Sayre</creator><creator>YATES, Robert Arthur</creator><creator>DIRKX, Wilfried Marc Renaat</creator><creator>TATE III, John Marshall</creator><creator>HEON, Jon Michael</creator><creator>POMERLEAU, Marcel Julien</creator><creator>COLOMA GONZÁLEZ, Juan</creator><scope>EVB</scope></search><sort><creationdate>20200715</creationdate><title>SUBMICRON PARTICLE REMOVAL FROM GAS STREAMS</title><author>HIGGINS, Brian Sayre ; YATES, Robert Arthur ; DIRKX, Wilfried Marc Renaat ; TATE III, John Marshall ; HEON, Jon Michael ; POMERLEAU, Marcel Julien ; COLOMA GONZÁLEZ, Juan</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP3454971B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2020</creationdate><topic>ACYCLIC OR CARBOCYCLIC COMPOUNDS</topic><topic>CHEMISTRY</topic><topic>FERTILISERS</topic><topic>MANUFACTURE THEREOF</topic><topic>METALLURGY</topic><topic>NITROGENOUS FERTILISERS</topic><topic>ORGANIC CHEMISTRY</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>SEPARATION</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>HIGGINS, Brian Sayre</creatorcontrib><creatorcontrib>YATES, Robert Arthur</creatorcontrib><creatorcontrib>DIRKX, Wilfried Marc Renaat</creatorcontrib><creatorcontrib>TATE III, John Marshall</creatorcontrib><creatorcontrib>HEON, Jon Michael</creatorcontrib><creatorcontrib>POMERLEAU, Marcel Julien</creatorcontrib><creatorcontrib>COLOMA GONZÁLEZ, Juan</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HIGGINS, Brian Sayre</au><au>YATES, Robert Arthur</au><au>DIRKX, Wilfried Marc Renaat</au><au>TATE III, John Marshall</au><au>HEON, Jon Michael</au><au>POMERLEAU, Marcel Julien</au><au>COLOMA GONZÁLEZ, Juan</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SUBMICRON PARTICLE REMOVAL FROM GAS STREAMS</title><date>2020-07-15</date><risdate>2020</risdate><abstract>Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h).</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ACYCLIC OR CARBOCYCLIC COMPOUNDS CHEMISTRY FERTILISERS MANUFACTURE THEREOF METALLURGY NITROGENOUS FERTILISERS ORGANIC CHEMISTRY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION TRANSPORTING |
| title | SUBMICRON PARTICLE REMOVAL FROM GAS STREAMS |
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