METHOD TO OPERATE AN APPARATUS FOR FEEDING LIQUID METAL TO AN EVAPORATOR DEVICE
A method to operate an apparatus for feeding liquid metal to an evaporator device in a vacuum chamber, wherein the feed tube runs from a container adapted to contain a liquid metal to the evaporator device and wherein an electromagnetic pump is provided in the feed tube and a valve in the feed tube...
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| creator | BAKKER, Eduard, Paul, Mattheus ZOESTBERGEN, Edzo KAISER, Timothy, Dean COMMANDEUR, Colin HAMILTON, Douglas, Alexander WIDDIS, Stephen, James SNIJDERS, Roland, Jan HAZELETT, Peter, William |
| description | A method to operate an apparatus for feeding liquid metal to an evaporator device in a vacuum chamber, wherein the feed tube runs from a container adapted to contain a liquid metal to the evaporator device and wherein an electromagnetic pump is provided in the feed tube and a valve in the feed tube between the electromagnetic pump and the evaporator device. An at least partially gas permeable electromagnetic pump, which is enclosed in a pressure controlled enclosure, is used in the method wherein electromagnetic pump and the pressure controlled enclosure are controlled such that filling and draining of the evaporator device and feed tube can be done without affecting the vacuum pressure in the vacuum chamber. |
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An at least partially gas permeable electromagnetic pump, which is enclosed in a pressure controlled enclosure, is used in the method wherein electromagnetic pump and the pressure controlled enclosure are controlled such that filling and draining of the evaporator device and feed tube can be done without affecting the vacuum pressure in the vacuum chamber.</description><language>eng ; fre ; ger</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; DYNAMO-ELECTRIC MACHINES ; ELECTRICITY ; GENERATION ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190313&DB=EPODOC&CC=EP&NR=3452631A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190313&DB=EPODOC&CC=EP&NR=3452631A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BAKKER, Eduard, Paul, Mattheus</creatorcontrib><creatorcontrib>ZOESTBERGEN, Edzo</creatorcontrib><creatorcontrib>KAISER, Timothy, Dean</creatorcontrib><creatorcontrib>COMMANDEUR, Colin</creatorcontrib><creatorcontrib>HAMILTON, Douglas, Alexander</creatorcontrib><creatorcontrib>WIDDIS, Stephen, James</creatorcontrib><creatorcontrib>SNIJDERS, Roland, Jan</creatorcontrib><creatorcontrib>HAZELETT, Peter, William</creatorcontrib><title>METHOD TO OPERATE AN APPARATUS FOR FEEDING LIQUID METAL TO AN EVAPORATOR DEVICE</title><description>A method to operate an apparatus for feeding liquid metal to an evaporator device in a vacuum chamber, wherein the feed tube runs from a container adapted to contain a liquid metal to the evaporator device and wherein an electromagnetic pump is provided in the feed tube and a valve in the feed tube between the electromagnetic pump and the evaporator device. An at least partially gas permeable electromagnetic pump, which is enclosed in a pressure controlled enclosure, is used in the method wherein electromagnetic pump and the pressure controlled enclosure are controlled such that filling and draining of the evaporator device and feed tube can be done without affecting the vacuum pressure in the vacuum chamber.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>CONVERSION OR DISTRIBUTION OF ELECTRIC POWER</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>DYNAMO-ELECTRIC MACHINES</subject><subject>ELECTRICITY</subject><subject>GENERATION</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPD3dQ3x8HdRCPFX8A9wDXIMcVVw9FNwDAhwBLJDgxXc_IMU3FxdXTz93BV8PANDPV0UgDocfUAagApdwxwD_IEqgapcXMM8nV15GFjTEnOKU3mhNDcDUHuIs4duakF-fGpxQWJyal5qSbxrgLGJqZGZsaGjoTERSgC6gi37</recordid><startdate>20190313</startdate><enddate>20190313</enddate><creator>BAKKER, Eduard, Paul, Mattheus</creator><creator>ZOESTBERGEN, Edzo</creator><creator>KAISER, Timothy, Dean</creator><creator>COMMANDEUR, Colin</creator><creator>HAMILTON, Douglas, Alexander</creator><creator>WIDDIS, Stephen, James</creator><creator>SNIJDERS, Roland, Jan</creator><creator>HAZELETT, Peter, William</creator><scope>EVB</scope></search><sort><creationdate>20190313</creationdate><title>METHOD TO OPERATE AN APPARATUS FOR FEEDING LIQUID METAL TO AN EVAPORATOR DEVICE</title><author>BAKKER, Eduard, Paul, Mattheus ; ZOESTBERGEN, Edzo ; KAISER, Timothy, Dean ; COMMANDEUR, Colin ; HAMILTON, Douglas, Alexander ; WIDDIS, Stephen, James ; SNIJDERS, Roland, Jan ; HAZELETT, Peter, William</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP3452631A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2019</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>CONVERSION OR DISTRIBUTION OF ELECTRIC POWER</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>DYNAMO-ELECTRIC MACHINES</topic><topic>ELECTRICITY</topic><topic>GENERATION</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>BAKKER, Eduard, Paul, Mattheus</creatorcontrib><creatorcontrib>ZOESTBERGEN, Edzo</creatorcontrib><creatorcontrib>KAISER, Timothy, Dean</creatorcontrib><creatorcontrib>COMMANDEUR, Colin</creatorcontrib><creatorcontrib>HAMILTON, Douglas, Alexander</creatorcontrib><creatorcontrib>WIDDIS, Stephen, James</creatorcontrib><creatorcontrib>SNIJDERS, Roland, Jan</creatorcontrib><creatorcontrib>HAZELETT, Peter, William</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BAKKER, Eduard, Paul, Mattheus</au><au>ZOESTBERGEN, Edzo</au><au>KAISER, Timothy, Dean</au><au>COMMANDEUR, Colin</au><au>HAMILTON, Douglas, Alexander</au><au>WIDDIS, Stephen, James</au><au>SNIJDERS, Roland, Jan</au><au>HAZELETT, Peter, William</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD TO OPERATE AN APPARATUS FOR FEEDING LIQUID METAL TO AN EVAPORATOR DEVICE</title><date>2019-03-13</date><risdate>2019</risdate><abstract>A method to operate an apparatus for feeding liquid metal to an evaporator device in a vacuum chamber, wherein the feed tube runs from a container adapted to contain a liquid metal to the evaporator device and wherein an electromagnetic pump is provided in the feed tube and a valve in the feed tube between the electromagnetic pump and the evaporator device. An at least partially gas permeable electromagnetic pump, which is enclosed in a pressure controlled enclosure, is used in the method wherein electromagnetic pump and the pressure controlled enclosure are controlled such that filling and draining of the evaporator device and feed tube can be done without affecting the vacuum pressure in the vacuum chamber.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng ; fre ; ger |
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| source | esp@cenet |
| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CONVERSION OR DISTRIBUTION OF ELECTRIC POWER DIFFUSION TREATMENT OF METALLIC MATERIAL DYNAMO-ELECTRIC MACHINES ELECTRICITY GENERATION INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | METHOD TO OPERATE AN APPARATUS FOR FEEDING LIQUID METAL TO AN EVAPORATOR DEVICE |
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