METHODS AND APPARATUS FOR LASER CLEANING OF SUBSTRATES

Disclosed are methods and apparatus for cleaning a substrate involving the application of optical energy to the substrate, typically in the form of a beam of light, where the energy of the beam causes removal of the contaminant from substrate. The cleaning may occur via any mechanism, including one...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: CLOWES, John Redvers
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
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