PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING AND FLEXOGRAPHIC PRINTING ORIGINAL PLATE

A photosensitive resin composition for flexographic printing, comprising at least (A) a hydrophilic copolymer, (B) an elastomer, (C) a polymerizable unsaturated monomer, and (D) a photopolymerization initiator, wherein, in a cross-section of a cured product of the resin composition, a phase area of...

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Hauptverfasser:	HONJO, Takafumi, SAITO, Hideo
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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creator	HONJO, Takafumi SAITO, Hideo
description	A photosensitive resin composition for flexographic printing, comprising at least (A) a hydrophilic copolymer, (B) an elastomer, (C) a polymerizable unsaturated monomer, and (D) a photopolymerization initiator, wherein, in a cross-section of a cured product of the resin composition, a phase area of a phase comprising the hydrophilic copolymer (A), SA, is 15% or more and 60% or less, and a proportion of the phase having a phase area of 3 µm 2 or more and less than 100 µm 2 is 20 (% by area) or more of the phase comprising the hydrophilic copolymer (A).
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fre ; ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20191106&DB=EPODOC&CC=EP&NR=3358410B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76418</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20191106&DB=EPODOC&CC=EP&NR=3358410B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HONJO, Takafumi</creatorcontrib><creatorcontrib>SAITO, Hideo</creatorcontrib><title>PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING AND FLEXOGRAPHIC PRINTING ORIGINAL PLATE</title><description>A photosensitive resin composition for flexographic printing, comprising at least (A) a hydrophilic copolymer, (B) an elastomer, (C) a polymerizable unsaturated monomer, and (D) a photopolymerization initiator, wherein, in a cross-section of a cured product of the resin composition, a phase area of a phase comprising the hydrophilic copolymer (A), SA, is 15% or more and 60% or less, and a proportion of the phase having a phase area of 3 µm 2 or more and less than 100 µm 2 is 20 (% by area) or more of the phase comprising the hydrophilic copolymer (A).</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNikEKwjAQAHvxIOof9gOCJQpeY9wkC3E3JKF4K6XEk2ih_h8RvAqeBmZm2YzRS5GMnKlQh5AwE4ORS5SPEQYrCWzAq7ikoycDMREXYgeazz-KJHLEOkAMuuC6WdyG-1w3X64asFiM39bp2dd5Gsb6qK8eo1KH477dnVr1x_IGKSk0kA</recordid><startdate>20191106</startdate><enddate>20191106</enddate><creator>HONJO, Takafumi</creator><creator>SAITO, Hideo</creator><scope>EVB</scope></search><sort><creationdate>20191106</creationdate><title>PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING AND FLEXOGRAPHIC PRINTING ORIGINAL PLATE</title><author>HONJO, Takafumi ; 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language	eng ; fre ; ger
recordid	cdi_epo_espacenet_EP3358410B1
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subjects	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
title	PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING AND FLEXOGRAPHIC PRINTING ORIGINAL PLATE
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