METHOD OF MANUFACTURING AN IMAGE SENSOR DEVICE

A method of manufacturing an image sensor device includes providing a metalized thin film transistor layer on a glass substrate; forming an inter-layer dielectric layer on the metalized thin film transistor layer; forming a via through the inter-layer dielectric layer; forming a metal layer the inte...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	O'ROURKE, Shawn Michael, PARK, Byung-Kyu, RODRIQUEZ, Robert
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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