METHOD AND SYSTEM FOR PROVIDING ULTRAPURE WATER WITH FLEXIBLE LAMP CONFIGURATION

METHOD AND SYSTEM FOR PROVIDING ULTRAPURE WATER WITH FLEXIBLE LAMP CONFIGURATION

A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulf...

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Hauptverfasser: HALL, Christopher, COULTER, Bruce Lee
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
CHEMISTRY
METALLURGY
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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COULTER, Bruce Lee
description A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate a continuously variable intensity of the actinic radiation.
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METALLURGY
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
title METHOD AND SYSTEM FOR PROVIDING ULTRAPURE WATER WITH FLEXIBLE LAMP CONFIGURATION
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