DEPOSITION MASK USING A METAL SUBSTRATE

Embodiments of the present invention relate to a mask structure applicable to a deposition process for an organic light-emitting device, etc., and allow provision of a deposition mask comprising: a first surface and a second surface which are orthogonal in the thickness direction of a metal plate an...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MOON, Byung Youl, KIM, Nam Ho, ROH, Geon Ho, HAN, Tae Hoon, CHO, Su Hyeon, LEE, Sang Beum, LIM, Jeong Ryong, PARK, Jae Seok, SON, Hyo Won, HWANG, Joo Hyun
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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