METAL SUBSTRATE, AND DEPOSITION MASK USING SAME
Embodiments of the present invention relate to a mask structure applicable to a deposition process for an organic light-emitting device, etc., and allow provision of a deposition mask comprising: a first surface and a second surface which are orthogonal in the thickness direction of a metal plate an...
Gespeichert in:
| Hauptverfasser: | , , , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; fre ; ger |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | MOON, Byung Youl KIM, Nam Ho ROH, Geon Ho HAN, Tae Hoon CHO, Su Hyeon LEE, Sang Beum LIM, Jeong Ryong PARK, Jae Seok SON, Hyo Won HWANG, Joo Hyun |
| description | Embodiments of the present invention relate to a mask structure applicable to a deposition process for an organic light-emitting device, etc., and allow provision of a deposition mask comprising: a first surface and a second surface which are orthogonal in the thickness direction of a metal plate and face each other; and multiple unit holes which have a first surface hole and a second surface hole which pass through the first surface and the second surface and are in connection with each other, wherein the size variation of the first surface hole or the second surface hole between neighboring unit holes is controlled within 2%-10% on the basis of the size variation between optional unit holes, or the center of the first surface hole and the center of the second surface hole are arranged at a location where the centers do not coincide with each other on the basis of the surface of the first surface. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP3288097A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP3288097A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP3288097A13</originalsourceid><addsrcrecordid>eNrjZND3dQ1x9FEIDnUKDglyDHHVUXD0c1FwcQ3wD_YM8fT3U_B1DPZWCA329HNXCHb0deVhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGuAcZGFhYGluaOhsZEKAEAs3EljQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METAL SUBSTRATE, AND DEPOSITION MASK USING SAME</title><source>esp@cenet</source><creator>MOON, Byung Youl ; KIM, Nam Ho ; ROH, Geon Ho ; HAN, Tae Hoon ; CHO, Su Hyeon ; LEE, Sang Beum ; LIM, Jeong Ryong ; PARK, Jae Seok ; SON, Hyo Won ; HWANG, Joo Hyun</creator><creatorcontrib>MOON, Byung Youl ; KIM, Nam Ho ; ROH, Geon Ho ; HAN, Tae Hoon ; CHO, Su Hyeon ; LEE, Sang Beum ; LIM, Jeong Ryong ; PARK, Jae Seok ; SON, Hyo Won ; HWANG, Joo Hyun</creatorcontrib><description>Embodiments of the present invention relate to a mask structure applicable to a deposition process for an organic light-emitting device, etc., and allow provision of a deposition mask comprising: a first surface and a second surface which are orthogonal in the thickness direction of a metal plate and face each other; and multiple unit holes which have a first surface hole and a second surface hole which pass through the first surface and the second surface and are in connection with each other, wherein the size variation of the first surface hole or the second surface hole between neighboring unit holes is controlled within 2%-10% on the basis of the size variation between optional unit holes, or the center of the first surface hole and the center of the second surface hole are arranged at a location where the centers do not coincide with each other on the basis of the surface of the first surface.</description><language>eng ; fre ; ger</language><subject>ELECTRICITY</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180228&DB=EPODOC&CC=EP&NR=3288097A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180228&DB=EPODOC&CC=EP&NR=3288097A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MOON, Byung Youl</creatorcontrib><creatorcontrib>KIM, Nam Ho</creatorcontrib><creatorcontrib>ROH, Geon Ho</creatorcontrib><creatorcontrib>HAN, Tae Hoon</creatorcontrib><creatorcontrib>CHO, Su Hyeon</creatorcontrib><creatorcontrib>LEE, Sang Beum</creatorcontrib><creatorcontrib>LIM, Jeong Ryong</creatorcontrib><creatorcontrib>PARK, Jae Seok</creatorcontrib><creatorcontrib>SON, Hyo Won</creatorcontrib><creatorcontrib>HWANG, Joo Hyun</creatorcontrib><title>METAL SUBSTRATE, AND DEPOSITION MASK USING SAME</title><description>Embodiments of the present invention relate to a mask structure applicable to a deposition process for an organic light-emitting device, etc., and allow provision of a deposition mask comprising: a first surface and a second surface which are orthogonal in the thickness direction of a metal plate and face each other; and multiple unit holes which have a first surface hole and a second surface hole which pass through the first surface and the second surface and are in connection with each other, wherein the size variation of the first surface hole or the second surface hole between neighboring unit holes is controlled within 2%-10% on the basis of the size variation between optional unit holes, or the center of the first surface hole and the center of the second surface hole are arranged at a location where the centers do not coincide with each other on the basis of the surface of the first surface.</description><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZND3dQ1x9FEIDnUKDglyDHHVUXD0c1FwcQ3wD_YM8fT3U_B1DPZWCA329HNXCHb0deVhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGuAcZGFhYGluaOhsZEKAEAs3EljQ</recordid><startdate>20180228</startdate><enddate>20180228</enddate><creator>MOON, Byung Youl</creator><creator>KIM, Nam Ho</creator><creator>ROH, Geon Ho</creator><creator>HAN, Tae Hoon</creator><creator>CHO, Su Hyeon</creator><creator>LEE, Sang Beum</creator><creator>LIM, Jeong Ryong</creator><creator>PARK, Jae Seok</creator><creator>SON, Hyo Won</creator><creator>HWANG, Joo Hyun</creator><scope>EVB</scope></search><sort><creationdate>20180228</creationdate><title>METAL SUBSTRATE, AND DEPOSITION MASK USING SAME</title><author>MOON, Byung Youl ; KIM, Nam Ho ; ROH, Geon Ho ; HAN, Tae Hoon ; CHO, Su Hyeon ; LEE, Sang Beum ; LIM, Jeong Ryong ; PARK, Jae Seok ; SON, Hyo Won ; HWANG, Joo Hyun</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP3288097A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2018</creationdate><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>MOON, Byung Youl</creatorcontrib><creatorcontrib>KIM, Nam Ho</creatorcontrib><creatorcontrib>ROH, Geon Ho</creatorcontrib><creatorcontrib>HAN, Tae Hoon</creatorcontrib><creatorcontrib>CHO, Su Hyeon</creatorcontrib><creatorcontrib>LEE, Sang Beum</creatorcontrib><creatorcontrib>LIM, Jeong Ryong</creatorcontrib><creatorcontrib>PARK, Jae Seok</creatorcontrib><creatorcontrib>SON, Hyo Won</creatorcontrib><creatorcontrib>HWANG, Joo Hyun</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MOON, Byung Youl</au><au>KIM, Nam Ho</au><au>ROH, Geon Ho</au><au>HAN, Tae Hoon</au><au>CHO, Su Hyeon</au><au>LEE, Sang Beum</au><au>LIM, Jeong Ryong</au><au>PARK, Jae Seok</au><au>SON, Hyo Won</au><au>HWANG, Joo Hyun</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METAL SUBSTRATE, AND DEPOSITION MASK USING SAME</title><date>2018-02-28</date><risdate>2018</risdate><abstract>Embodiments of the present invention relate to a mask structure applicable to a deposition process for an organic light-emitting device, etc., and allow provision of a deposition mask comprising: a first surface and a second surface which are orthogonal in the thickness direction of a metal plate and face each other; and multiple unit holes which have a first surface hole and a second surface hole which pass through the first surface and the second surface and are in connection with each other, wherein the size variation of the first surface hole or the second surface hole between neighboring unit holes is controlled within 2%-10% on the basis of the size variation between optional unit holes, or the center of the first surface hole and the center of the second surface hole are arranged at a location where the centers do not coincide with each other on the basis of the surface of the first surface.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; fre ; ger |
| recordid | cdi_epo_espacenet_EP3288097A1 |
| source | esp@cenet |
| subjects | ELECTRICITY |
| title | METAL SUBSTRATE, AND DEPOSITION MASK USING SAME |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-13T05%3A08%3A37IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=MOON,%20Byung%20Youl&rft.date=2018-02-28&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP3288097A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |