GAS DISTRIBUTION DEVICE FOR FLUIDISED-BED REACTOR SYSTEM, FLUIDISED-BED REACTOR SYSTEM COMPRISING GAS DISTRIBUTION DEVICE, AND METHOD FOR PREPARING GRANULAR POLYSILICON USING FLUIDISED-BED REACTOR SYSTEM
The present invention relates to a gas distribution unit for a fluidized bed reactor system, a fluidized bed reactor system having the gas distribution unit, and a method for preparing granular polysilicon using the fluidized bed reactor system. The gas distribution unit for a fluidized bed reactor...
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creator | AHN, Gui Ryong HAN, Joo Hee LEE, Won Ik KIM, Gil Ho KIM, Sang Ah KIM, Ji Ho |
description | The present invention relates to a gas distribution unit for a fluidized bed reactor system, a fluidized bed reactor system having the gas distribution unit, and a method for preparing granular polysilicon using the fluidized bed reactor system. The gas distribution unit for a fluidized bed reactor system according to the present invention enables gas flow rate control and gas composition control for each zone within the plenum chamber. In addition, a fluidized bed reactor system having the gas distribution unit enables shape control of a fluidized bed (in particular, transition between a bubbling fluidized bed and a spout fluidized bed). The method for preparing granular polysilicon using the fluidized bed reactor system not only simultaneously improves process stability and productivity, but also enables more flexible handling in the event of an abnormal situation. |
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The gas distribution unit for a fluidized bed reactor system according to the present invention enables gas flow rate control and gas composition control for each zone within the plenum chamber. In addition, a fluidized bed reactor system having the gas distribution unit enables shape control of a fluidized bed (in particular, transition between a bubbling fluidized bed and a spout fluidized bed). The method for preparing granular polysilicon using the fluidized bed reactor system not only simultaneously improves process stability and productivity, but also enables more flexible handling in the event of an abnormal situation.</description><language>eng ; fre ; ger</language><subject>BLASTING ; CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; COMPOUNDS THEREOF ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; FURNACES ; FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL ; HEATING ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; INORGANIC CHEMISTRY ; KILNS ; LIGHTING ; MECHANICAL ENGINEERING ; METALLURGY ; NON-METALLIC ELEMENTS ; OPEN SINTERING OR LIKE APPARATUS ; OVENS ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; RETORTS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; THEIR RELEVANT APPARATUS ; TRANSPORTING ; WEAPONS</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190116&DB=EPODOC&CC=EP&NR=3278872A4$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25553,76306</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190116&DB=EPODOC&CC=EP&NR=3278872A4$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>AHN, Gui Ryong</creatorcontrib><creatorcontrib>HAN, Joo Hee</creatorcontrib><creatorcontrib>LEE, Won Ik</creatorcontrib><creatorcontrib>KIM, Gil Ho</creatorcontrib><creatorcontrib>KIM, Sang Ah</creatorcontrib><creatorcontrib>KIM, Ji Ho</creatorcontrib><title>GAS DISTRIBUTION DEVICE FOR FLUIDISED-BED REACTOR SYSTEM, FLUIDISED-BED REACTOR SYSTEM COMPRISING GAS DISTRIBUTION DEVICE, AND METHOD FOR PREPARING GRANULAR POLYSILICON USING FLUIDISED-BED REACTOR SYSTEM</title><description>The present invention relates to a gas distribution unit for a fluidized bed reactor system, a fluidized bed reactor system having the gas distribution unit, and a method for preparing granular polysilicon using the fluidized bed reactor system. The gas distribution unit for a fluidized bed reactor system according to the present invention enables gas flow rate control and gas composition control for each zone within the plenum chamber. In addition, a fluidized bed reactor system having the gas distribution unit enables shape control of a fluidized bed (in particular, transition between a bubbling fluidized bed and a spout fluidized bed). The method for preparing granular polysilicon using the fluidized bed reactor system not only simultaneously improves process stability and productivity, but also enables more flexible handling in the event of an abnormal situation.</description><subject>BLASTING</subject><subject>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>COMPOUNDS THEREOF</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>FURNACES</subject><subject>FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL</subject><subject>HEATING</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>INORGANIC CHEMISTRY</subject><subject>KILNS</subject><subject>LIGHTING</subject><subject>MECHANICAL ENGINEERING</subject><subject>METALLURGY</subject><subject>NON-METALLIC ELEMENTS</subject><subject>OPEN SINTERING OR LIKE APPARATUS</subject><subject>OVENS</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>RETORTS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>THEIR RELEVANT APPARATUS</subject><subject>TRANSPORTING</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjcsKgkAUht20iOodzgPoRgPdjjNHPaAzw1wCVyIxraIEe8teKpG2Sasf_tu3j941syDIOkOld6QkCLwQR6iUgar1tGQokhIFGGTcLa7trcMu3kyBq04bsiRr-EGIgUkBHbpGiZWmDWpm1oVh0rdssVTbW2qJLyu_nm1Bj9HuNt7ncPrqIYIKHW-SMD2HME_jNTzCa0CdpXlR5Ck7Z39UPp84UMY</recordid><startdate>20190116</startdate><enddate>20190116</enddate><creator>AHN, Gui Ryong</creator><creator>HAN, Joo Hee</creator><creator>LEE, Won Ik</creator><creator>KIM, Gil Ho</creator><creator>KIM, Sang Ah</creator><creator>KIM, Ji Ho</creator><scope>EVB</scope></search><sort><creationdate>20190116</creationdate><title>GAS DISTRIBUTION DEVICE FOR FLUIDISED-BED REACTOR SYSTEM, FLUIDISED-BED REACTOR SYSTEM COMPRISING GAS DISTRIBUTION DEVICE, AND METHOD FOR PREPARING GRANULAR POLYSILICON USING FLUIDISED-BED REACTOR SYSTEM</title><author>AHN, Gui Ryong ; HAN, Joo Hee ; LEE, Won Ik ; KIM, Gil Ho ; KIM, Sang Ah ; KIM, Ji Ho</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP3278872A43</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2019</creationdate><topic>BLASTING</topic><topic>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>COMPOUNDS THEREOF</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>FURNACES</topic><topic>FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL</topic><topic>HEATING</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>INORGANIC CHEMISTRY</topic><topic>KILNS</topic><topic>LIGHTING</topic><topic>MECHANICAL ENGINEERING</topic><topic>METALLURGY</topic><topic>NON-METALLIC ELEMENTS</topic><topic>OPEN SINTERING OR LIKE APPARATUS</topic><topic>OVENS</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>RETORTS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>THEIR RELEVANT APPARATUS</topic><topic>TRANSPORTING</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>AHN, Gui Ryong</creatorcontrib><creatorcontrib>HAN, Joo Hee</creatorcontrib><creatorcontrib>LEE, Won Ik</creatorcontrib><creatorcontrib>KIM, Gil Ho</creatorcontrib><creatorcontrib>KIM, Sang Ah</creatorcontrib><creatorcontrib>KIM, Ji Ho</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>AHN, Gui Ryong</au><au>HAN, Joo Hee</au><au>LEE, Won Ik</au><au>KIM, Gil Ho</au><au>KIM, Sang Ah</au><au>KIM, Ji Ho</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>GAS DISTRIBUTION DEVICE FOR FLUIDISED-BED REACTOR SYSTEM, FLUIDISED-BED REACTOR SYSTEM COMPRISING GAS DISTRIBUTION DEVICE, AND METHOD FOR PREPARING GRANULAR POLYSILICON USING FLUIDISED-BED REACTOR SYSTEM</title><date>2019-01-16</date><risdate>2019</risdate><abstract>The present invention relates to a gas distribution unit for a fluidized bed reactor system, a fluidized bed reactor system having the gas distribution unit, and a method for preparing granular polysilicon using the fluidized bed reactor system. The gas distribution unit for a fluidized bed reactor system according to the present invention enables gas flow rate control and gas composition control for each zone within the plenum chamber. In addition, a fluidized bed reactor system having the gas distribution unit enables shape control of a fluidized bed (in particular, transition between a bubbling fluidized bed and a spout fluidized bed). The method for preparing granular polysilicon using the fluidized bed reactor system not only simultaneously improves process stability and productivity, but also enables more flexible handling in the event of an abnormal situation.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | BLASTING CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS THEREOF DIFFUSION TREATMENT OF METALLIC MATERIAL FURNACES FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL HEATING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY KILNS LIGHTING MECHANICAL ENGINEERING METALLURGY NON-METALLIC ELEMENTS OPEN SINTERING OR LIKE APPARATUS OVENS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL RETORTS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING WEAPONS |
title | GAS DISTRIBUTION DEVICE FOR FLUIDISED-BED REACTOR SYSTEM, FLUIDISED-BED REACTOR SYSTEM COMPRISING GAS DISTRIBUTION DEVICE, AND METHOD FOR PREPARING GRANULAR POLYSILICON USING FLUIDISED-BED REACTOR SYSTEM |
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