METHOD FOR THE PREPARATION OF SYNTHETIC QUARTZ GLASS WITH THE USE OF A CLEANING DEVICE

A method for the production of synthetic quartz glass using a special cleaning device is provided. The method includes (a) evaporating a production material containing a polymerizable polyalkylsiloxane compound while forming a production material vapor, (b) passing the production material vapor resu...

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Bibliographische Detailangaben
Hauptverfasser:	TROMMER, Martin, LAUDAHN, Hilmar, BADEKE, Klaus-Uwe
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY GLASS MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES METALLURGY MINERAL OR SLAG WOOL PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	A method for the production of synthetic quartz glass using a special cleaning device is provided. The method includes (a) evaporating a production material containing a polymerizable polyalkylsiloxane compound while forming a production material vapor, (b) passing the production material vapor resulting from step (a) through a cleaning device to purify the production material vapor, (c) supplying the purified production material vapor resulting from step (b) to a reaction zone in which the purified production material vapor is converted to SiO2 particles through oxidation and/or through hydrolysis, (d) depositing the SiO2 particles resulting from step (c) on a deposition surface, and optionally drying and vitrifying the deposited SiO2 particles resulting from step (d) to form synthetic quartz glass. The cleaning device includes a bulk of porous silica particles which have a BET specific surface area of at least 2 m2/g. A device for carrying out the method is also provided.