ISOLATION OF CHARGED PARTICLE OPTICS FROM VACUUM CHAMBER DEFORMATIONS

ISOLATION OF CHARGED PARTICLE OPTICS FROM VACUUM CHAMBER DEFORMATIONS

A charged particle processing apparatus includes a vacuum chamber, an optics plate, charged particle optics mounted to the optics plate, and mounting members coupled between the optics plate and a chamber wall. The mounting members are configured for isolating the optics plate from deformation of th...

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1. Verfasser: PERELMAN, Gershon
Format: Patent
Sprache:eng ; fre ; ger
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BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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description A charged particle processing apparatus includes a vacuum chamber, an optics plate, charged particle optics mounted to the optics plate, and mounting members coupled between the optics plate and a chamber wall. The mounting members are configured for isolating the optics plate from deformation of the chamber wall, as may occur due to a pressure differential between the chamber interior and the environment outside the chamber. The isolation may prevent deformation from affecting the alignment and positioning of the charged particle optics. The charged particles may, for example, be ions or electrons. Thus, the apparatus may be utilized, for example, in analytical instruments such as for mass spectrometry, or inspection instruments such as for electron microscopy.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP3198626A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP3198626A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP3198626A13</originalsourceid><addsrcrecordid>eNrjZHD1DPb3cQzx9PdT8HdTcPZwDHJ3dVEIcAwK8XT2cVXwDwDSwQpuQf6-CmGOzqGhviA1vk6uQQourm7-Qb5grcE8DKxpiTnFqbxQmptBwc01xNlDN7UgPz61uCAxOTUvtSTeNcDY0NLCzMjM0dCYCCUALdMrtw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ISOLATION OF CHARGED PARTICLE OPTICS FROM VACUUM CHAMBER DEFORMATIONS</title><source>esp@cenet</source><creator>PERELMAN, Gershon</creator><creatorcontrib>PERELMAN, Gershon</creatorcontrib><description>A charged particle processing apparatus includes a vacuum chamber, an optics plate, charged particle optics mounted to the optics plate, and mounting members coupled between the optics plate and a chamber wall. The mounting members are configured for isolating the optics plate from deformation of the chamber wall, as may occur due to a pressure differential between the chamber interior and the environment outside the chamber. The isolation may prevent deformation from affecting the alignment and positioning of the charged particle optics. The charged particles may, for example, be ions or electrons. Thus, the apparatus may be utilized, for example, in analytical instruments such as for mass spectrometry, or inspection instruments such as for electron microscopy.</description><language>eng ; fre ; ger</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20170802&amp;DB=EPODOC&amp;CC=EP&amp;NR=3198626A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20170802&amp;DB=EPODOC&amp;CC=EP&amp;NR=3198626A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>PERELMAN, Gershon</creatorcontrib><title>ISOLATION OF CHARGED PARTICLE OPTICS FROM VACUUM CHAMBER DEFORMATIONS</title><description>A charged particle processing apparatus includes a vacuum chamber, an optics plate, charged particle optics mounted to the optics plate, and mounting members coupled between the optics plate and a chamber wall. The mounting members are configured for isolating the optics plate from deformation of the chamber wall, as may occur due to a pressure differential between the chamber interior and the environment outside the chamber. The isolation may prevent deformation from affecting the alignment and positioning of the charged particle optics. The charged particles may, for example, be ions or electrons. Thus, the apparatus may be utilized, for example, in analytical instruments such as for mass spectrometry, or inspection instruments such as for electron microscopy.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHD1DPb3cQzx9PdT8HdTcPZwDHJ3dVEIcAwK8XT2cVXwDwDSwQpuQf6-CmGOzqGhviA1vk6uQQourm7-Qb5grcE8DKxpiTnFqbxQmptBwc01xNlDN7UgPz61uCAxOTUvtSTeNcDY0NLCzMjM0dCYCCUALdMrtw</recordid><startdate>20170802</startdate><enddate>20170802</enddate><creator>PERELMAN, Gershon</creator><scope>EVB</scope></search><sort><creationdate>20170802</creationdate><title>ISOLATION OF CHARGED PARTICLE OPTICS FROM VACUUM CHAMBER DEFORMATIONS</title><author>PERELMAN, Gershon</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP3198626A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2017</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>PERELMAN, Gershon</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>PERELMAN, Gershon</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ISOLATION OF CHARGED PARTICLE OPTICS FROM VACUUM CHAMBER DEFORMATIONS</title><date>2017-08-02</date><risdate>2017</risdate><abstract>A charged particle processing apparatus includes a vacuum chamber, an optics plate, charged particle optics mounted to the optics plate, and mounting members coupled between the optics plate and a chamber wall. The mounting members are configured for isolating the optics plate from deformation of the chamber wall, as may occur due to a pressure differential between the chamber interior and the environment outside the chamber. The isolation may prevent deformation from affecting the alignment and positioning of the charged particle optics. The charged particles may, for example, be ions or electrons. Thus, the apparatus may be utilized, for example, in analytical instruments such as for mass spectrometry, or inspection instruments such as for electron microscopy.</abstract><oa>free_for_read</oa></addata></record>
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language eng ; fre ; ger
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
title ISOLATION OF CHARGED PARTICLE OPTICS FROM VACUUM CHAMBER DEFORMATIONS
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-26T00%3A47%3A24IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=PERELMAN,%20Gershon&rft.date=2017-08-02&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP3198626A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true