COATING FILM, MANUFACTURING METHOD FOR SAME
Provided are a coating film, a manufacturing method for the same, and a PVD device that not only sufficiently improve the balance of low-friction properties and wear resistance, but also improve chipping resistance and peeling resistance. This film is coated on a substrate surface, wherein the coati...
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| creator | TANAKA, Yoshikazu SUGIURA, Hiroyuki OGAWA, Katsuaki MORIGUCHI, Hideki ARAHI, Tetsumi SHIBATA, Akinori ITO, Yoshihiro SAITO, Tadashi OKAZAKI, Takahiro |
| description | Provided are a coating film, a manufacturing method for the same, and a PVD device that not only sufficiently improve the balance of low-friction properties and wear resistance, but also improve chipping resistance and peeling resistance. This film is coated on a substrate surface, wherein the coating film has a hard carbon that presents relatively black and white when observed in a cross-sectional bright-field TEM image, a mesh-shaped hard carbon layer is formed using a PVD method, said layer having white-colored hard carbon in a mesh shape extending in the thickness direction and black-colored hard carbon dispersed into the cavities in the mesh, and the ID/IG ratio is 1-6 when the mesh-shaped hard carbon layer is measured using Raman spectroscopy, said ratio being the ratio of the Raman spectrum D band peak area intensity and G band peak area intensity. The coating film manufacturing method and the device use an arc PVD method, and while controlling the bias voltage, arc current, and heater temperature, etc. to maintain a substrate temperature exceeding 200°C but not exceeding 300°C, also coat the substrate surface with the hard carbon film by rotating and/or revolving the substrate. |
| format | Patent |
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The coating film manufacturing method and the device use an arc PVD method, and while controlling the bias voltage, arc current, and heater temperature, etc. to maintain a substrate temperature exceeding 200°C but not exceeding 300°C, also coat the substrate surface with the hard carbon film by rotating and/or revolving the substrate.</description><language>eng ; fre ; ger</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230913&DB=EPODOC&CC=EP&NR=3196331B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230913&DB=EPODOC&CC=EP&NR=3196331B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TANAKA, Yoshikazu</creatorcontrib><creatorcontrib>SUGIURA, Hiroyuki</creatorcontrib><creatorcontrib>OGAWA, Katsuaki</creatorcontrib><creatorcontrib>MORIGUCHI, Hideki</creatorcontrib><creatorcontrib>ARAHI, Tetsumi</creatorcontrib><creatorcontrib>SHIBATA, Akinori</creatorcontrib><creatorcontrib>ITO, Yoshihiro</creatorcontrib><creatorcontrib>SAITO, Tadashi</creatorcontrib><creatorcontrib>OKAZAKI, Takahiro</creatorcontrib><title>COATING FILM, MANUFACTURING METHOD FOR SAME</title><description>Provided are a coating film, a manufacturing method for the same, and a PVD device that not only sufficiently improve the balance of low-friction properties and wear resistance, but also improve chipping resistance and peeling resistance. This film is coated on a substrate surface, wherein the coating film has a hard carbon that presents relatively black and white when observed in a cross-sectional bright-field TEM image, a mesh-shaped hard carbon layer is formed using a PVD method, said layer having white-colored hard carbon in a mesh shape extending in the thickness direction and black-colored hard carbon dispersed into the cavities in the mesh, and the ID/IG ratio is 1-6 when the mesh-shaped hard carbon layer is measured using Raman spectroscopy, said ratio being the ratio of the Raman spectrum D band peak area intensity and G band peak area intensity. The coating film manufacturing method and the device use an arc PVD method, and while controlling the bias voltage, arc current, and heater temperature, etc. to maintain a substrate temperature exceeding 200°C but not exceeding 300°C, also coat the substrate surface with the hard carbon film by rotating and/or revolving the substrate.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNB29ncM8fRzV3Dz9PHVUfB19At1c3QOCQ0Cifm6hnj4uyi4-QcpBDv6uvIwsKYl5hSn8kJpbgYFN9cQZw_d1IL8-NTigsTk1LzUknjXAGNDSzNjY0MnQ2MilAAAFp4kSw</recordid><startdate>20230913</startdate><enddate>20230913</enddate><creator>TANAKA, Yoshikazu</creator><creator>SUGIURA, Hiroyuki</creator><creator>OGAWA, Katsuaki</creator><creator>MORIGUCHI, Hideki</creator><creator>ARAHI, Tetsumi</creator><creator>SHIBATA, Akinori</creator><creator>ITO, Yoshihiro</creator><creator>SAITO, Tadashi</creator><creator>OKAZAKI, Takahiro</creator><scope>EVB</scope></search><sort><creationdate>20230913</creationdate><title>COATING FILM, MANUFACTURING METHOD FOR SAME</title><author>TANAKA, Yoshikazu ; SUGIURA, Hiroyuki ; OGAWA, Katsuaki ; MORIGUCHI, Hideki ; ARAHI, Tetsumi ; SHIBATA, Akinori ; ITO, Yoshihiro ; SAITO, Tadashi ; OKAZAKI, Takahiro</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP3196331B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2023</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>TANAKA, Yoshikazu</creatorcontrib><creatorcontrib>SUGIURA, Hiroyuki</creatorcontrib><creatorcontrib>OGAWA, Katsuaki</creatorcontrib><creatorcontrib>MORIGUCHI, Hideki</creatorcontrib><creatorcontrib>ARAHI, Tetsumi</creatorcontrib><creatorcontrib>SHIBATA, Akinori</creatorcontrib><creatorcontrib>ITO, Yoshihiro</creatorcontrib><creatorcontrib>SAITO, Tadashi</creatorcontrib><creatorcontrib>OKAZAKI, Takahiro</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TANAKA, Yoshikazu</au><au>SUGIURA, Hiroyuki</au><au>OGAWA, Katsuaki</au><au>MORIGUCHI, Hideki</au><au>ARAHI, Tetsumi</au><au>SHIBATA, Akinori</au><au>ITO, Yoshihiro</au><au>SAITO, Tadashi</au><au>OKAZAKI, Takahiro</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>COATING FILM, MANUFACTURING METHOD FOR SAME</title><date>2023-09-13</date><risdate>2023</risdate><abstract>Provided are a coating film, a manufacturing method for the same, and a PVD device that not only sufficiently improve the balance of low-friction properties and wear resistance, but also improve chipping resistance and peeling resistance. This film is coated on a substrate surface, wherein the coating film has a hard carbon that presents relatively black and white when observed in a cross-sectional bright-field TEM image, a mesh-shaped hard carbon layer is formed using a PVD method, said layer having white-colored hard carbon in a mesh shape extending in the thickness direction and black-colored hard carbon dispersed into the cavities in the mesh, and the ID/IG ratio is 1-6 when the mesh-shaped hard carbon layer is measured using Raman spectroscopy, said ratio being the ratio of the Raman spectrum D band peak area intensity and G band peak area intensity. The coating film manufacturing method and the device use an arc PVD method, and while controlling the bias voltage, arc current, and heater temperature, etc. to maintain a substrate temperature exceeding 200°C but not exceeding 300°C, also coat the substrate surface with the hard carbon film by rotating and/or revolving the substrate.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | COATING FILM, MANUFACTURING METHOD FOR SAME |
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