METHOD AND SYSTEM FOR CONVERGENT POLISHING
A method of mounting a workpiece to a substrate is disclosed, the method comprising: determining a peak-to-valley height value; determining a value related to pitch area; computing a relative area of pitch; computing a button radius; computing a number of pitch buttons; coupling the computed number,...
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| creator | WONG, Lana L DYLLA-SPEARS, Rebecca J STEELE, William A DESJARDIN, Richard P GERAGHTY, Paul BUDE, Jeffrey D SURATWALA, Tayyab I FEIT, Michael D MILLER, Philip E MASON, Daniel C |
| description | A method of mounting a workpiece to a substrate is disclosed, the method comprising: determining a peak-to-valley height value; determining a value related to pitch area; computing a relative area of pitch; computing a button radius; computing a number of pitch buttons; coupling the computed number, N, of pitch buttons to the workpiece; and coupling the N pitch buttons to the substrate. Also disclosed is a slurry system for polishing an optical element, the slurry system comprising: a solvent; an abrasive component supported in the solvent; and a surfactant supported in the solvent. |
| format | Patent |
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Also disclosed is a slurry system for polishing an optical element, the slurry system comprising: a solvent; an abrasive component supported in the solvent; and a surfactant supported in the solvent.</description><language>eng ; fre ; ger</language><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; POLISHING ; TRANSPORTING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221221&DB=EPODOC&CC=EP&NR=3187304B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221221&DB=EPODOC&CC=EP&NR=3187304B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WONG, Lana L</creatorcontrib><creatorcontrib>DYLLA-SPEARS, Rebecca J</creatorcontrib><creatorcontrib>STEELE, William A</creatorcontrib><creatorcontrib>DESJARDIN, Richard P</creatorcontrib><creatorcontrib>GERAGHTY, Paul</creatorcontrib><creatorcontrib>BUDE, Jeffrey D</creatorcontrib><creatorcontrib>SURATWALA, Tayyab I</creatorcontrib><creatorcontrib>FEIT, Michael D</creatorcontrib><creatorcontrib>MILLER, Philip E</creatorcontrib><creatorcontrib>MASON, Daniel C</creatorcontrib><title>METHOD AND SYSTEM FOR CONVERGENT POLISHING</title><description>A method of mounting a workpiece to a substrate is disclosed, the method comprising: determining a peak-to-valley height value; determining a value related to pitch area; computing a relative area of pitch; computing a button radius; computing a number of pitch buttons; coupling the computed number, N, of pitch buttons to the workpiece; and coupling the N pitch buttons to the substrate. Also disclosed is a slurry system for polishing an optical element, the slurry system comprising: a solvent; an abrasive component supported in the solvent; and a surfactant supported in the solvent.</description><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNDydQ3x8HdRcPRzUQiODA5x9VVw8w9ScPb3C3MNcnf1C1EI8PfxDPbw9HPnYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxrgHGhhbmxgYmTobGRCgBABHTJFc</recordid><startdate>20221221</startdate><enddate>20221221</enddate><creator>WONG, Lana L</creator><creator>DYLLA-SPEARS, Rebecca J</creator><creator>STEELE, William A</creator><creator>DESJARDIN, Richard P</creator><creator>GERAGHTY, Paul</creator><creator>BUDE, Jeffrey D</creator><creator>SURATWALA, Tayyab I</creator><creator>FEIT, Michael D</creator><creator>MILLER, Philip E</creator><creator>MASON, Daniel C</creator><scope>EVB</scope></search><sort><creationdate>20221221</creationdate><title>METHOD AND SYSTEM FOR CONVERGENT POLISHING</title><author>WONG, Lana L ; DYLLA-SPEARS, Rebecca J ; STEELE, William A ; DESJARDIN, Richard P ; GERAGHTY, Paul ; BUDE, Jeffrey D ; SURATWALA, Tayyab I ; FEIT, Michael D ; MILLER, Philip E ; MASON, Daniel C</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP3187304B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2022</creationdate><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>WONG, Lana L</creatorcontrib><creatorcontrib>DYLLA-SPEARS, Rebecca J</creatorcontrib><creatorcontrib>STEELE, William A</creatorcontrib><creatorcontrib>DESJARDIN, Richard P</creatorcontrib><creatorcontrib>GERAGHTY, Paul</creatorcontrib><creatorcontrib>BUDE, Jeffrey D</creatorcontrib><creatorcontrib>SURATWALA, Tayyab I</creatorcontrib><creatorcontrib>FEIT, Michael D</creatorcontrib><creatorcontrib>MILLER, Philip E</creatorcontrib><creatorcontrib>MASON, Daniel C</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WONG, Lana L</au><au>DYLLA-SPEARS, Rebecca J</au><au>STEELE, William A</au><au>DESJARDIN, Richard P</au><au>GERAGHTY, Paul</au><au>BUDE, Jeffrey D</au><au>SURATWALA, Tayyab I</au><au>FEIT, Michael D</au><au>MILLER, Philip E</au><au>MASON, Daniel C</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD AND SYSTEM FOR CONVERGENT POLISHING</title><date>2022-12-21</date><risdate>2022</risdate><abstract>A method of mounting a workpiece to a substrate is disclosed, the method comprising: determining a peak-to-valley height value; determining a value related to pitch area; computing a relative area of pitch; computing a button radius; computing a number of pitch buttons; coupling the computed number, N, of pitch buttons to the workpiece; and coupling the N pitch buttons to the substrate. Also disclosed is a slurry system for polishing an optical element, the slurry system comprising: a solvent; an abrasive component supported in the solvent; and a surfactant supported in the solvent.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING |
| title | METHOD AND SYSTEM FOR CONVERGENT POLISHING |
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