TRANSISTOR STRUCTURE WITH IMPROVED UNCLAMPED INDUCTIVE SWITCHING IMMUNITY

A laterally diffused metal oxide semiconductor (LDMOS) transistor structure with improved unclamped inductive switching immunity. The LDMOS includes a substrate and an adjacent epitaxial layer both of a first conductivity type. A gate structure is above the epitaxial layer. A drain region and a sour...

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Bibliographische Detailangaben
Hauptverfasser: TERRILL, Kyle, BOBDE, Madhur, ZHANG, Wenjie, CHEN, Qufei
Format: Patent
Sprache:eng ; fre ; ger
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