CORNER ROUNDING CORRECTION FOR ELECTRON BEAM (EBEAM) DIRECT WRITE SYSTEM

CORNER ROUNDING CORRECTION FOR ELECTRON BEAM (EBEAM) DIRECT WRITE SYSTEM

Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool includes a first column of openings along a first direction, each of the openings of the first column of opening...

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1. Verfasser: BORODOVSKY, Yan A
Format: Patent
Sprache:eng ; fre ; ger
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BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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description Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool includes a first column of openings along a first direction, each of the openings of the first column of openings having dog-eared corners. The BAA also includes a second column of openings along the first direction and staggered from the first column of openings, each of the openings of the second column of openings having dog-eared corners. The first and second columns of openings together form an array having a pitch in the first direction. A scan direction of the BAA is along a second direction, orthogonal to the first direction. The pitch of the array corresponds to half of a minimal pitch layout of a target pattern of lines for orientation parallel with the second direction.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP3183742A4</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP3183742A4</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP3183742A43</originalsourceid><addsrcrecordid>eNrjZPBw9g_ycw1SCPIP9XPx9HNXAPKDXJ1DPP39FNz8gxRcfYCcICDHydXRV0HDFURpKrh4gtQohAd5hrgqBEcGh7j68jCwpiXmFKfyQmluBgU31xBnD93Ugvz41OKCxOTUvNSSeNcAY0MLY3MTI0cTYyKUAACeESxK</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>CORNER ROUNDING CORRECTION FOR ELECTRON BEAM (EBEAM) DIRECT WRITE SYSTEM</title><source>esp@cenet</source><creator>BORODOVSKY, Yan A</creator><creatorcontrib>BORODOVSKY, Yan A</creatorcontrib><description>Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool includes a first column of openings along a first direction, each of the openings of the first column of openings having dog-eared corners. The BAA also includes a second column of openings along the first direction and staggered from the first column of openings, each of the openings of the second column of openings having dog-eared corners. The first and second columns of openings together form an array having a pitch in the first direction. A scan direction of the BAA is along a second direction, orthogonal to the first direction. The pitch of the array corresponds to half of a minimal pitch layout of a target pattern of lines for orientation parallel with the second direction.</description><language>eng ; fre ; ger</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20180718&amp;DB=EPODOC&amp;CC=EP&amp;NR=3183742A4$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20180718&amp;DB=EPODOC&amp;CC=EP&amp;NR=3183742A4$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BORODOVSKY, Yan A</creatorcontrib><title>CORNER ROUNDING CORRECTION FOR ELECTRON BEAM (EBEAM) DIRECT WRITE SYSTEM</title><description>Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool includes a first column of openings along a first direction, each of the openings of the first column of openings having dog-eared corners. The BAA also includes a second column of openings along the first direction and staggered from the first column of openings, each of the openings of the second column of openings having dog-eared corners. The first and second columns of openings together form an array having a pitch in the first direction. A scan direction of the BAA is along a second direction, orthogonal to the first direction. The pitch of the array corresponds to half of a minimal pitch layout of a target pattern of lines for orientation parallel with the second direction.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPBw9g_ycw1SCPIP9XPx9HNXAPKDXJ1DPP39FNz8gxRcfYCcICDHydXRV0HDFURpKrh4gtQohAd5hrgqBEcGh7j68jCwpiXmFKfyQmluBgU31xBnD93Ugvz41OKCxOTUvNSSeNcAY0MLY3MTI0cTYyKUAACeESxK</recordid><startdate>20180718</startdate><enddate>20180718</enddate><creator>BORODOVSKY, Yan A</creator><scope>EVB</scope></search><sort><creationdate>20180718</creationdate><title>CORNER ROUNDING CORRECTION FOR ELECTRON BEAM (EBEAM) DIRECT WRITE SYSTEM</title><author>BORODOVSKY, Yan A</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP3183742A43</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2018</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>BORODOVSKY, Yan A</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BORODOVSKY, Yan A</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CORNER ROUNDING CORRECTION FOR ELECTRON BEAM (EBEAM) DIRECT WRITE SYSTEM</title><date>2018-07-18</date><risdate>2018</risdate><abstract>Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool includes a first column of openings along a first direction, each of the openings of the first column of openings having dog-eared corners. The BAA also includes a second column of openings along the first direction and staggered from the first column of openings, each of the openings of the second column of openings having dog-eared corners. The first and second columns of openings together form an array having a pitch in the first direction. A scan direction of the BAA is along a second direction, orthogonal to the first direction. The pitch of the array corresponds to half of a minimal pitch layout of a target pattern of lines for orientation parallel with the second direction.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
title CORNER ROUNDING CORRECTION FOR ELECTRON BEAM (EBEAM) DIRECT WRITE SYSTEM
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