SYSTEM AND METHOD BASED ON LOW-PRESSURE CHEMICAL VAPOR DEPOSITION FOR FABRICATING PEROVSKITE FILM

A system and method for fabricating a perovskite film is provided, the system including a housing for use as a CVD furnace having first and second sections coupled with first and second temperature control units, respectively. The first and second sections correspond substantially to the upstream an...

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Bibliographische Detailangaben
Hauptverfasser: LEYDEN, Matthew Ryan, QI, Yabing
Format: Patent
Sprache:eng ; fre ; ger
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