TEMPORARY SUBSTRATE BONDING METHOD USING A POLYIMIDE RELEASE LAYER AND SUBSTRATE STACK INCLUDING SAID POLYIMIDE RELEASE LAYER
The invention broadly relates to release layer compositions that enable thin wafer handling during microelectronics manufacturing. Preferred release layers are formed from compositions comprising a polyamic acid or polyimide dissolved or dispersed in a solvent system, followed by curing and/or solve...
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creator | WU, Qi BAI, Dongshun FLAIM, Tony D ZHONG, Xing-Fu LIU, Xiao |
description | The invention broadly relates to release layer compositions that enable thin wafer handling during microelectronics manufacturing. Preferred release layers are formed from compositions comprising a polyamic acid or polyimide dissolved or dispersed in a solvent system, followed by curing and/or solvent removal at about 250° C. to about 350° C. for less than about 10 minutes, yielding a thin film. This process forms the release compositions into polyimide release layers that can be used in temporary bonding processes, and laser debonded after the desired processing has been carried out. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP3172762B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP3172762B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP3172762B13</originalsourceid><addsrcrecordid>eNqNjL0KwjAURrM4iPoO9wUc2oKdb5OrDeaP_AyZSpE4iRbq6ruL4uAiOH0cOOdbskck7axHnyGkLkSPkaCzRkhzAE2xtwJSeAGCsypLLQWBJ0UYCBRm8oBGfMUhIj-CNFyl90lAKX6la7Y4j5e5bD67YrCnyPttmW5DmafxVK7lPpBrqrZud3VXNX8oT3THOyc</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>TEMPORARY SUBSTRATE BONDING METHOD USING A POLYIMIDE RELEASE LAYER AND SUBSTRATE STACK INCLUDING SAID POLYIMIDE RELEASE LAYER</title><source>esp@cenet</source><creator>WU, Qi ; BAI, Dongshun ; FLAIM, Tony D ; ZHONG, Xing-Fu ; LIU, Xiao</creator><creatorcontrib>WU, Qi ; BAI, Dongshun ; FLAIM, Tony D ; ZHONG, Xing-Fu ; LIU, Xiao</creatorcontrib><description>The invention broadly relates to release layer compositions that enable thin wafer handling during microelectronics manufacturing. Preferred release layers are formed from compositions comprising a polyamic acid or polyimide dissolved or dispersed in a solvent system, followed by curing and/or solvent removal at about 250° C. to about 350° C. for less than about 10 minutes, yielding a thin film. This process forms the release compositions into polyimide release layers that can be used in temporary bonding processes, and laser debonded after the desired processing has been carried out.</description><language>eng ; fre ; ger</language><subject>ADHESIVES ; BASIC ELECTRIC ELEMENTS ; CHEMICAL PAINT OR INK REMOVERS ; CHEMISTRY ; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS ; COMPOSITIONS BASED THEREON ; CORRECTING FLUIDS ; DYES ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FILLING PASTES ; INKS ; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; ORGANIC MACROMOLECULAR COMPOUNDS ; PAINTS ; PASTES OR SOLIDS FOR COLOURING OR PRINTING ; POLISHES ; SEMICONDUCTOR DEVICES ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF MATERIALS THEREFOR ; WOODSTAINS</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210421&DB=EPODOC&CC=EP&NR=3172762B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210421&DB=EPODOC&CC=EP&NR=3172762B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WU, Qi</creatorcontrib><creatorcontrib>BAI, Dongshun</creatorcontrib><creatorcontrib>FLAIM, Tony D</creatorcontrib><creatorcontrib>ZHONG, Xing-Fu</creatorcontrib><creatorcontrib>LIU, Xiao</creatorcontrib><title>TEMPORARY SUBSTRATE BONDING METHOD USING A POLYIMIDE RELEASE LAYER AND SUBSTRATE STACK INCLUDING SAID POLYIMIDE RELEASE LAYER</title><description>The invention broadly relates to release layer compositions that enable thin wafer handling during microelectronics manufacturing. Preferred release layers are formed from compositions comprising a polyamic acid or polyimide dissolved or dispersed in a solvent system, followed by curing and/or solvent removal at about 250° C. to about 350° C. for less than about 10 minutes, yielding a thin film. This process forms the release compositions into polyimide release layers that can be used in temporary bonding processes, and laser debonded after the desired processing has been carried out.</description><subject>ADHESIVES</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL PAINT OR INK REMOVERS</subject><subject>CHEMISTRY</subject><subject>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>CORRECTING FLUIDS</subject><subject>DYES</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>FILLING PASTES</subject><subject>INKS</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>PAINTS</subject><subject>PASTES OR SOLIDS FOR COLOURING OR PRINTING</subject><subject>POLISHES</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>USE OF MATERIALS THEREFOR</subject><subject>WOODSTAINS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjL0KwjAURrM4iPoO9wUc2oKdb5OrDeaP_AyZSpE4iRbq6ruL4uAiOH0cOOdbskck7axHnyGkLkSPkaCzRkhzAE2xtwJSeAGCsypLLQWBJ0UYCBRm8oBGfMUhIj-CNFyl90lAKX6la7Y4j5e5bD67YrCnyPttmW5DmafxVK7lPpBrqrZud3VXNX8oT3THOyc</recordid><startdate>20210421</startdate><enddate>20210421</enddate><creator>WU, Qi</creator><creator>BAI, Dongshun</creator><creator>FLAIM, Tony D</creator><creator>ZHONG, Xing-Fu</creator><creator>LIU, Xiao</creator><scope>EVB</scope></search><sort><creationdate>20210421</creationdate><title>TEMPORARY SUBSTRATE BONDING METHOD USING A POLYIMIDE RELEASE LAYER AND SUBSTRATE STACK INCLUDING SAID POLYIMIDE RELEASE LAYER</title><author>WU, Qi ; BAI, Dongshun ; FLAIM, Tony D ; ZHONG, Xing-Fu ; LIU, Xiao</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP3172762B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2021</creationdate><topic>ADHESIVES</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL PAINT OR INK REMOVERS</topic><topic>CHEMISTRY</topic><topic>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>CORRECTING FLUIDS</topic><topic>DYES</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>FILLING PASTES</topic><topic>INKS</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>PAINTS</topic><topic>PASTES OR SOLIDS FOR COLOURING OR PRINTING</topic><topic>POLISHES</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>USE OF MATERIALS THEREFOR</topic><topic>WOODSTAINS</topic><toplevel>online_resources</toplevel><creatorcontrib>WU, Qi</creatorcontrib><creatorcontrib>BAI, Dongshun</creatorcontrib><creatorcontrib>FLAIM, Tony D</creatorcontrib><creatorcontrib>ZHONG, Xing-Fu</creatorcontrib><creatorcontrib>LIU, Xiao</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WU, Qi</au><au>BAI, Dongshun</au><au>FLAIM, Tony D</au><au>ZHONG, Xing-Fu</au><au>LIU, Xiao</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>TEMPORARY SUBSTRATE BONDING METHOD USING A POLYIMIDE RELEASE LAYER AND SUBSTRATE STACK INCLUDING SAID POLYIMIDE RELEASE LAYER</title><date>2021-04-21</date><risdate>2021</risdate><abstract>The invention broadly relates to release layer compositions that enable thin wafer handling during microelectronics manufacturing. Preferred release layers are formed from compositions comprising a polyamic acid or polyimide dissolved or dispersed in a solvent system, followed by curing and/or solvent removal at about 250° C. to about 350° C. for less than about 10 minutes, yielding a thin film. This process forms the release compositions into polyimide release layers that can be used in temporary bonding processes, and laser debonded after the desired processing has been carried out.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | ADHESIVES BASIC ELECTRIC ELEMENTS CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON CORRECTING FLUIDS DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FILLING PASTES INKS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING POLISHES SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS THEREFOR WOODSTAINS |
title | TEMPORARY SUBSTRATE BONDING METHOD USING A POLYIMIDE RELEASE LAYER AND SUBSTRATE STACK INCLUDING SAID POLYIMIDE RELEASE LAYER |
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