FLOAT ZONE SILICON WAFER MANUFACTURING SYSTEM

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Hauptverfasser: GOORSKY, Mark, Stanley, YAKUB, Andrew, X, ROSENZWEIG, James, Benjamin
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Sprache:eng ; fre ; ger
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YAKUB, Andrew, X
ROSENZWEIG, James, Benjamin
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language eng ; fre ; ger
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subjects AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE
APPARATUS THEREFOR
CHEMISTRY
CRYSTAL GROWTH
METALLURGY
PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE
REFINING BY ZONE-MELTING OF MATERIAL
SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE
SINGLE-CRYSTAL-GROWTH
UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
title FLOAT ZONE SILICON WAFER MANUFACTURING SYSTEM
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