SELECTIVE, ELECTROCHEMICAL ETCHING OF A SEMICONDUCTOR

Methods for facilitating fabricating semiconductor structures are provided which include: providing a multilayer structure including a semiconductor layer, the semiconductor layer including a dopant and having an increased conductivity; selectively increasing, using electrochemical processing, poros...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CHOW, Tat-Sing, DAHAL, Rajendra P, BHAT, Ishwara B
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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