EXTREME ULTRAVIOLET LIGHT SOURCE

A first remaining plasma that at least partially coincides with a target region is formed; a target including target material in a first spatial distribution to the target region is provided, the target material including material that emits EUV light when converted to plasma; the first remaining pl...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TAO, YEZHENG, STEWART, JOHN TOM, BROWN, DANIEL J.W
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY X-RAY TECHNIQUE
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