APPARATUS AND PROCESS FOR DEPOSITION AND ANNEALING OF ANTI-FINGERPRINT COATINGS
The invention further addresses a deposition process for a substrate to be annealed by exposing it to water-vapour under sub atmospheric pressure at a temperature of ca. 130° C. for about 5 s.
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| creator | PLAGWITZ, HEIKO VOSER, STEPHAN |
| description | The invention further addresses a deposition process for a substrate to be annealed by exposing it to water-vapour under sub atmospheric pressure at a temperature of ca. 130° C. for about 5 s. |
| format | Patent |
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| language | eng ; fre ; ger |
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| subjects | APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PERFORMING OPERATIONS PHYSICS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING |
| title | APPARATUS AND PROCESS FOR DEPOSITION AND ANNEALING OF ANTI-FINGERPRINT COATINGS |
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