SACRIFICIAL MATERIAL FOR STRIPPING MASKING LAYERS

Techniques and structures for protecting etched features during etch mask removal. In embodiments, a mask is patterned and a substrate layer etched to transfer the pattern. Subsequent to etching the substrate layer, features patterned into the substrate are covered with a sacrificial material backfi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	RAHHAL-ORABI, NADIA, SUNDARARAJAN, SHAKUNTALA, TROEGER, RALPH T, HARPER, MICHAEL, GULER, LEONARD
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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