BEAM SPLITTING APPARATUS, LITHOGAPHIC SYSTEM AND METHOD
A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one...
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| creator | BANINE, Vadim ENGELEN, Wouter DE JAGER, Pieter DE VRIES, Gosse GRIMMINCK, Leonardus NIKIPELOV, Andrey VAN GORKOM, Ramon RENKENS, Michael BARTRAIJ, Petrus AMENT, Lucas DONKER, Rilpho NIENHUYS, Han-Kwang LOOPSTRA, Erik KATALENIC, Andelko FRIJNS, Olav KRUIZINGA, Borgert JANSSEN, Franciscus |
| description | A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP3049870B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP3049870B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP3049870B13</originalsourceid><addsrcrecordid>eNrjZDB3cnX0VQgO8PEMCfH0c1dwDAhwDHIMCQ3WUQAKefi7OwZ4eDorBEcGh7j6Kjj6uSj4ugKFXXgYWNMSc4pTeaE0N4OCm2uIs4duakF-fGpxQWJyal5qSbxrgLGBiaWFuYGToTERSgDzTifb</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>BEAM SPLITTING APPARATUS, LITHOGAPHIC SYSTEM AND METHOD</title><source>esp@cenet</source><creator>BANINE, Vadim ; ENGELEN, Wouter ; DE JAGER, Pieter ; DE VRIES, Gosse ; GRIMMINCK, Leonardus ; NIKIPELOV, Andrey ; VAN GORKOM, Ramon ; RENKENS, Michael ; BARTRAIJ, Petrus ; AMENT, Lucas ; DONKER, Rilpho ; NIENHUYS, Han-Kwang ; LOOPSTRA, Erik ; KATALENIC, Andelko ; FRIJNS, Olav ; KRUIZINGA, Borgert ; JANSSEN, Franciscus</creator><creatorcontrib>BANINE, Vadim ; ENGELEN, Wouter ; DE JAGER, Pieter ; DE VRIES, Gosse ; GRIMMINCK, Leonardus ; NIKIPELOV, Andrey ; VAN GORKOM, Ramon ; RENKENS, Michael ; BARTRAIJ, Petrus ; AMENT, Lucas ; DONKER, Rilpho ; NIENHUYS, Han-Kwang ; LOOPSTRA, Erik ; KATALENIC, Andelko ; FRIJNS, Olav ; KRUIZINGA, Borgert ; JANSSEN, Franciscus</creatorcontrib><description>A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.</description><language>eng ; fre ; ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; DEVICES USING STIMULATED EMISSION ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; GAMMA RAY OR X-RAY MICROSCOPES ; HOLOGRAPHY ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; IRRADIATION DEVICES ; MATERIALS THEREFOR ; MEASURING ; NUCLEAR ENGINEERING ; NUCLEAR PHYSICS ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS ; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR ; TESTING</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190515&DB=EPODOC&CC=EP&NR=3049870B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190515&DB=EPODOC&CC=EP&NR=3049870B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BANINE, Vadim</creatorcontrib><creatorcontrib>ENGELEN, Wouter</creatorcontrib><creatorcontrib>DE JAGER, Pieter</creatorcontrib><creatorcontrib>DE VRIES, Gosse</creatorcontrib><creatorcontrib>GRIMMINCK, Leonardus</creatorcontrib><creatorcontrib>NIKIPELOV, Andrey</creatorcontrib><creatorcontrib>VAN GORKOM, Ramon</creatorcontrib><creatorcontrib>RENKENS, Michael</creatorcontrib><creatorcontrib>BARTRAIJ, Petrus</creatorcontrib><creatorcontrib>AMENT, Lucas</creatorcontrib><creatorcontrib>DONKER, Rilpho</creatorcontrib><creatorcontrib>NIENHUYS, Han-Kwang</creatorcontrib><creatorcontrib>LOOPSTRA, Erik</creatorcontrib><creatorcontrib>KATALENIC, Andelko</creatorcontrib><creatorcontrib>FRIJNS, Olav</creatorcontrib><creatorcontrib>KRUIZINGA, Borgert</creatorcontrib><creatorcontrib>JANSSEN, Franciscus</creatorcontrib><title>BEAM SPLITTING APPARATUS, LITHOGAPHIC SYSTEM AND METHOD</title><description>A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>DEVICES USING STIMULATED EMISSION</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>GAMMA RAY OR X-RAY MICROSCOPES</subject><subject>HOLOGRAPHY</subject><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>IRRADIATION DEVICES</subject><subject>MATERIALS THEREFOR</subject><subject>MEASURING</subject><subject>NUCLEAR ENGINEERING</subject><subject>NUCLEAR PHYSICS</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><subject>TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDB3cnX0VQgO8PEMCfH0c1dwDAhwDHIMCQ3WUQAKefi7OwZ4eDorBEcGh7j6Kjj6uSj4ugKFXXgYWNMSc4pTeaE0N4OCm2uIs4duakF-fGpxQWJyal5qSbxrgLGBiaWFuYGToTERSgDzTifb</recordid><startdate>20190515</startdate><enddate>20190515</enddate><creator>BANINE, Vadim</creator><creator>ENGELEN, Wouter</creator><creator>DE JAGER, Pieter</creator><creator>DE VRIES, Gosse</creator><creator>GRIMMINCK, Leonardus</creator><creator>NIKIPELOV, Andrey</creator><creator>VAN GORKOM, Ramon</creator><creator>RENKENS, Michael</creator><creator>BARTRAIJ, Petrus</creator><creator>AMENT, Lucas</creator><creator>DONKER, Rilpho</creator><creator>NIENHUYS, Han-Kwang</creator><creator>LOOPSTRA, Erik</creator><creator>KATALENIC, Andelko</creator><creator>FRIJNS, Olav</creator><creator>KRUIZINGA, Borgert</creator><creator>JANSSEN, Franciscus</creator><scope>EVB</scope></search><sort><creationdate>20190515</creationdate><title>BEAM SPLITTING APPARATUS, LITHOGAPHIC SYSTEM AND METHOD</title><author>BANINE, Vadim ; ENGELEN, Wouter ; DE JAGER, Pieter ; DE VRIES, Gosse ; GRIMMINCK, Leonardus ; NIKIPELOV, Andrey ; VAN GORKOM, Ramon ; RENKENS, Michael ; BARTRAIJ, Petrus ; AMENT, Lucas ; DONKER, Rilpho ; NIENHUYS, Han-Kwang ; LOOPSTRA, Erik ; KATALENIC, Andelko ; FRIJNS, Olav ; KRUIZINGA, Borgert ; JANSSEN, Franciscus</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP3049870B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2019</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>DEVICES USING STIMULATED EMISSION</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>GAMMA RAY OR X-RAY MICROSCOPES</topic><topic>HOLOGRAPHY</topic><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>IRRADIATION DEVICES</topic><topic>MATERIALS THEREFOR</topic><topic>MEASURING</topic><topic>NUCLEAR ENGINEERING</topic><topic>NUCLEAR PHYSICS</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><topic>TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>BANINE, Vadim</creatorcontrib><creatorcontrib>ENGELEN, Wouter</creatorcontrib><creatorcontrib>DE JAGER, Pieter</creatorcontrib><creatorcontrib>DE VRIES, Gosse</creatorcontrib><creatorcontrib>GRIMMINCK, Leonardus</creatorcontrib><creatorcontrib>NIKIPELOV, Andrey</creatorcontrib><creatorcontrib>VAN GORKOM, Ramon</creatorcontrib><creatorcontrib>RENKENS, Michael</creatorcontrib><creatorcontrib>BARTRAIJ, Petrus</creatorcontrib><creatorcontrib>AMENT, Lucas</creatorcontrib><creatorcontrib>DONKER, Rilpho</creatorcontrib><creatorcontrib>NIENHUYS, Han-Kwang</creatorcontrib><creatorcontrib>LOOPSTRA, Erik</creatorcontrib><creatorcontrib>KATALENIC, Andelko</creatorcontrib><creatorcontrib>FRIJNS, Olav</creatorcontrib><creatorcontrib>KRUIZINGA, Borgert</creatorcontrib><creatorcontrib>JANSSEN, Franciscus</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BANINE, Vadim</au><au>ENGELEN, Wouter</au><au>DE JAGER, Pieter</au><au>DE VRIES, Gosse</au><au>GRIMMINCK, Leonardus</au><au>NIKIPELOV, Andrey</au><au>VAN GORKOM, Ramon</au><au>RENKENS, Michael</au><au>BARTRAIJ, Petrus</au><au>AMENT, Lucas</au><au>DONKER, Rilpho</au><au>NIENHUYS, Han-Kwang</au><au>LOOPSTRA, Erik</au><au>KATALENIC, Andelko</au><au>FRIJNS, Olav</au><au>KRUIZINGA, Borgert</au><au>JANSSEN, Franciscus</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>BEAM SPLITTING APPARATUS, LITHOGAPHIC SYSTEM AND METHOD</title><date>2019-05-15</date><risdate>2019</risdate><abstract>A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES USING STIMULATED EMISSION ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES IRRADIATION DEVICES MATERIALS THEREFOR MEASURING NUCLEAR ENGINEERING NUCLEAR PHYSICS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR TESTING |
| title | BEAM SPLITTING APPARATUS, LITHOGAPHIC SYSTEM AND METHOD |
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