REFLECTIVE PHOTOMASK AND PRODUCTION METHOD THEREFOR

A reflective photomask (10) includes: a substrate (11); a multilayer reflection film (12) formed on the substrate and reflecting exposure light including light with a wavelength of 5 nm to 15 nm for lithography; an absorption film (14) formed on the multilayer reflection film (12) and absorbing the...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	IMOTO, Tomohiro, WATANABE, Genta, FUKUGAMI, Norihito
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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