ELECTROLYTIC COPPER PLATING SOLUTION
An electrolytic copper plating solution is disclosed which can form a rectangular circuit pattern. A method for conducting electrolytic plating on a board by using the electrolytic copper plating solution and an electrolytic circuit which is formed by using the electrolytic copper plating solution i...
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creator | SAITO, Mutsuko MIZUNO, Yoko SAKAI, Makoto MORINAGA, Toshiyuki HAYASHI, Shinjiro |
description | An electrolytic copper plating solution is disclosed which can form a rectangular circuit pattern. A method for conducting electrolytic plating on a board by using the electrolytic copper plating solution and an electrolytic circuit which is formed by using the electrolytic copper plating solution is also described. The electrolytic copper plating solution contains two kinds of specific surfactants. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP3037572B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP3037572B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP3037572B13</originalsourceid><addsrcrecordid>eNrjZFBx9XF1Dgny94kM8XRWcPYPCHANUgjwcQzx9HNXCPb3CQ3x9PfjYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxrgHGBsbmpuZGTobGRCgBAF29IvM</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ELECTROLYTIC COPPER PLATING SOLUTION</title><source>esp@cenet</source><creator>SAITO, Mutsuko ; MIZUNO, Yoko ; SAKAI, Makoto ; MORINAGA, Toshiyuki ; HAYASHI, Shinjiro</creator><creatorcontrib>SAITO, Mutsuko ; MIZUNO, Yoko ; SAKAI, Makoto ; MORINAGA, Toshiyuki ; HAYASHI, Shinjiro</creatorcontrib><description>An electrolytic copper plating solution is disclosed which can form a rectangular circuit pattern. A method for conducting electrolytic plating on a board by using the electrolytic copper plating solution and an electrolytic circuit which is formed by using the electrolytic copper plating solution is also described. The electrolytic copper plating solution contains two kinds of specific surfactants.</description><language>eng ; fre ; ger</language><subject>APPARATUS THEREFOR ; CHEMISTRY ; ELECTROFORMING ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; METALLURGY ; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190424&DB=EPODOC&CC=EP&NR=3037572B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190424&DB=EPODOC&CC=EP&NR=3037572B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SAITO, Mutsuko</creatorcontrib><creatorcontrib>MIZUNO, Yoko</creatorcontrib><creatorcontrib>SAKAI, Makoto</creatorcontrib><creatorcontrib>MORINAGA, Toshiyuki</creatorcontrib><creatorcontrib>HAYASHI, Shinjiro</creatorcontrib><title>ELECTROLYTIC COPPER PLATING SOLUTION</title><description>An electrolytic copper plating solution is disclosed which can form a rectangular circuit pattern. A method for conducting electrolytic plating on a board by using the electrolytic copper plating solution and an electrolytic circuit which is formed by using the electrolytic copper plating solution is also described. The electrolytic copper plating solution contains two kinds of specific surfactants.</description><subject>APPARATUS THEREFOR</subject><subject>CHEMISTRY</subject><subject>ELECTROFORMING</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>METALLURGY</subject><subject>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFBx9XF1Dgny94kM8XRWcPYPCHANUgjwcQzx9HNXCPb3CQ3x9PfjYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxrgHGBsbmpuZGTobGRCgBAF29IvM</recordid><startdate>20190424</startdate><enddate>20190424</enddate><creator>SAITO, Mutsuko</creator><creator>MIZUNO, Yoko</creator><creator>SAKAI, Makoto</creator><creator>MORINAGA, Toshiyuki</creator><creator>HAYASHI, Shinjiro</creator><scope>EVB</scope></search><sort><creationdate>20190424</creationdate><title>ELECTROLYTIC COPPER PLATING SOLUTION</title><author>SAITO, Mutsuko ; MIZUNO, Yoko ; SAKAI, Makoto ; MORINAGA, Toshiyuki ; HAYASHI, Shinjiro</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP3037572B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2019</creationdate><topic>APPARATUS THEREFOR</topic><topic>CHEMISTRY</topic><topic>ELECTROFORMING</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>METALLURGY</topic><topic>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</topic><toplevel>online_resources</toplevel><creatorcontrib>SAITO, Mutsuko</creatorcontrib><creatorcontrib>MIZUNO, Yoko</creatorcontrib><creatorcontrib>SAKAI, Makoto</creatorcontrib><creatorcontrib>MORINAGA, Toshiyuki</creatorcontrib><creatorcontrib>HAYASHI, Shinjiro</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SAITO, Mutsuko</au><au>MIZUNO, Yoko</au><au>SAKAI, Makoto</au><au>MORINAGA, Toshiyuki</au><au>HAYASHI, Shinjiro</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ELECTROLYTIC COPPER PLATING SOLUTION</title><date>2019-04-24</date><risdate>2019</risdate><abstract>An electrolytic copper plating solution is disclosed which can form a rectangular circuit pattern. A method for conducting electrolytic plating on a board by using the electrolytic copper plating solution and an electrolytic circuit which is formed by using the electrolytic copper plating solution is also described. The electrolytic copper plating solution contains two kinds of specific surfactants.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS |
title | ELECTROLYTIC COPPER PLATING SOLUTION |
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