DEVICE FOR DEPOSITING A MATERIAL BY PULSED LASER DEPOSITION AND A METHOD FOR DEPOSITING A MATERIAL WITH THE DEVICE

The invention relates to a device for depositing a material by pulsed laser deposition, the device comprising: - a vacuum chamber; - at least one substrate holder with a substrate, arranged inside the vacuum chamber, the substrate having a first, second and third direction, each of the three directi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Janssens, Jan Arnaud, Dekkers, Jan Matthijn
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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