PELLICLE
The purpose of the present invention is to provide a pellicle which has, on the inner surface of the pellicle frame, a pressure-sensitive adhesive layer that has holding performance capable of satisfactorily adhering suspended substances including dust thereto and that has excellent resistance to sh...
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| creator | KONDOU, MASAHIRO TSUMOTO, TAKAMASA |
| description | The purpose of the present invention is to provide a pellicle which has, on the inner surface of the pellicle frame, a pressure-sensitive adhesive layer that has holding performance capable of satisfactorily adhering suspended substances including dust thereto and that has excellent resistance to short-wavelength light. This pellicle comprises a pellicle frame, a pellicle film stretched over the pellicle frame, and a pressure-sensitive adhesive layer disposed inside the pellicle frame, wherein the pressure-sensitive adhesive layer comprises a copolymer having structural units represented by formula (1) and structural units represented by formula (2), the amount of the copolymer being 60 mass% or more of the pressure-sensitive adhesive layer.
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ-CH 2 CF 2 -€ƒ€ƒ€ƒ€ƒ€ƒ(1)
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ-CF 2 CF(CF 3 )-€ƒ€ƒ€ƒ€ƒ€ƒ(2) |
| format | Patent |
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€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ-CH 2 CF 2 -€ƒ€ƒ€ƒ€ƒ€ƒ(1)
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ-CF 2 CF(CF 3 )-€ƒ€ƒ€ƒ€ƒ€ƒ(2)</description><language>eng ; fre ; ger</language><subject>ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE ; ADHESIVES ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; DYES ; ELECTROGRAPHY ; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC ; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS ; HOLOGRAPHY ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; MATERIALS THEREFOR ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PAINTS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; POLISHES ; TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION ; TECHNICAL SUBJECTS COVERED BY FORMER USPC ; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF MATERIALS AS ADHESIVES</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150610&DB=EPODOC&CC=EP&NR=2881792A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150610&DB=EPODOC&CC=EP&NR=2881792A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KONDOU, MASAHIRO</creatorcontrib><creatorcontrib>TSUMOTO, TAKAMASA</creatorcontrib><title>PELLICLE</title><description>The purpose of the present invention is to provide a pellicle which has, on the inner surface of the pellicle frame, a pressure-sensitive adhesive layer that has holding performance capable of satisfactorily adhering suspended substances including dust thereto and that has excellent resistance to short-wavelength light. This pellicle comprises a pellicle frame, a pellicle film stretched over the pellicle frame, and a pressure-sensitive adhesive layer disposed inside the pellicle frame, wherein the pressure-sensitive adhesive layer comprises a copolymer having structural units represented by formula (1) and structural units represented by formula (2), the amount of the copolymer being 60 mass% or more of the pressure-sensitive adhesive layer.
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ-CH 2 CF 2 -€ƒ€ƒ€ƒ€ƒ€ƒ(1)
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ-CF 2 CF(CF 3 )-€ƒ€ƒ€ƒ€ƒ€ƒ(2)</description><subject>ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE</subject><subject>ADHESIVES</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>DYES</subject><subject>ELECTROGRAPHY</subject><subject>GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC</subject><subject>GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS</subject><subject>HOLOGRAPHY</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PAINTS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>POLISHES</subject><subject>TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION</subject><subject>TECHNICAL SUBJECTS COVERED BY FORMER USPC</subject><subject>TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>USE OF MATERIALS AS ADHESIVES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZOAIcPXx8XT2ceVhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGuAUYWFobmlkaOhsZEKAEA7XAa6w</recordid><startdate>20150610</startdate><enddate>20150610</enddate><creator>KONDOU, MASAHIRO</creator><creator>TSUMOTO, TAKAMASA</creator><scope>EVB</scope></search><sort><creationdate>20150610</creationdate><title>PELLICLE</title><author>KONDOU, MASAHIRO ; TSUMOTO, TAKAMASA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP2881792A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2015</creationdate><topic>ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE</topic><topic>ADHESIVES</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>DYES</topic><topic>ELECTROGRAPHY</topic><topic>GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC</topic><topic>GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS</topic><topic>HOLOGRAPHY</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PAINTS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>POLISHES</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER USPC</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>USE OF MATERIALS AS ADHESIVES</topic><toplevel>online_resources</toplevel><creatorcontrib>KONDOU, MASAHIRO</creatorcontrib><creatorcontrib>TSUMOTO, TAKAMASA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KONDOU, MASAHIRO</au><au>TSUMOTO, TAKAMASA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PELLICLE</title><date>2015-06-10</date><risdate>2015</risdate><abstract>The purpose of the present invention is to provide a pellicle which has, on the inner surface of the pellicle frame, a pressure-sensitive adhesive layer that has holding performance capable of satisfactorily adhering suspended substances including dust thereto and that has excellent resistance to short-wavelength light. This pellicle comprises a pellicle frame, a pellicle film stretched over the pellicle frame, and a pressure-sensitive adhesive layer disposed inside the pellicle frame, wherein the pressure-sensitive adhesive layer comprises a copolymer having structural units represented by formula (1) and structural units represented by formula (2), the amount of the copolymer being 60 mass% or more of the pressure-sensitive adhesive layer.
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ-CH 2 CF 2 -€ƒ€ƒ€ƒ€ƒ€ƒ(1)
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ-CF 2 CF(CF 3 )-€ƒ€ƒ€ƒ€ƒ€ƒ(2)</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng ; fre ; ger |
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| subjects | ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON DYES ELECTROGRAPHY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PAINTS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS AS ADHESIVES |
| title | PELLICLE |
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