METHOD FOR FORMING CONDUCTIVE FILM AND SINTERING PROMOTER

In a conductive film forming method using photo sintering, a conductive film having low electric resistance is easily formed. The conductive film forming method is a method in which a conductive film 5 is formed using photo sintering. This method includes the steps of forming a layer 22 made of a si...

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Bibliographische Detailangaben
Hauptverfasser: KAWATO, YUICHI, KUDO, TOMIO, MAEDA, YUSUKE
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:In a conductive film forming method using photo sintering, a conductive film having low electric resistance is easily formed. The conductive film forming method is a method in which a conductive film 5 is formed using photo sintering. This method includes the steps of forming a layer 22 made of a sintering promoter 2 on a substrate, forming a liquid film 3 made of a copper particulate dispersion on the layer 22 of the sintering promoter 2, drying the liquid film 3 to form a copper particulate layer 4, and subjecting the copper particulate layer 4 to photo sintering. The sintering promoter 2 is a compound which removes copper oxide from metallic copper. Thereby, the sintering promoter 2 removes a surface oxide film of copper particulates 31 in photo sintering.