SUBSTRATE PROCESSING METHOD

An apparatus for processing reaction products that are deposited when an etching target film contained in a target object to be processed is etched is provided with: a processing chamber; a partition plate; a plasma source; a mounting table; a first processing gas supply unit; a second processing ga...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NISHIMURA EIICHI, YAMASHITA FUMIKO, SHIMIZU AKITAKA, URAYAMA DAISUKE
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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