Semiconductor substrate including a cooling channel and method of forming a semiconductor substrate including a cooling channel
A semiconductor substrate (12) for use in an integrated circuit includes a channel (22) defined on a surface (18) of the substrate (12). The channel (22) includes a first wall (24), a second wall (26), and a third wall (28). The first wall (24) is recessed from the surface (18). The second wall (26)...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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