Exhaust gas sampling apparatus
The present invention is one that, in an exhaust gas sampling apparatus having a configuration in which a heat exchanger is not provided on an upstream side of a CVS, regulates a flow rate of diluted exhaust gas flowing into an analytical device to a predetermined value, and provided with: a main fl...
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| creator | Asami, Tetsuji Nishimoto, Akihiro Hisamori, Yosuke |
| description | The present invention is one that, in an exhaust gas sampling apparatus having a configuration in which a heat exchanger is not provided on an upstream side of a CVS, regulates a flow rate of diluted exhaust gas flowing into an analytical device to a predetermined value, and provided with: a main flow path 4; the CVS 5 provided in the main flow path 4; a diluted exhaust gas sampling flow path 6 for sampling part of the diluted exhaust gas from the main flow path 4 to introduce the part into the analytical device 10; a flow rate control mechanism 7 that controls a flow rate of the diluted exhaust gas to be sampled through the diluted exhaust gas sampling flow path 6; and a control device 8 that sets a split flow ratio that is a ratio of the flow rate of the diluted exhaust gas to be sampled through the diluted exhaust gas sampling flow path 6 to a flow rate of the diluted exhaust gas flowing through the CVS 5, wherein the control device 8 uses the flow rate (Q CVS ) of the diluted exhaust gas flowing through the CVS 5 or a value (T CVS or P CVS ) related to the flow rate (Qcvs) of the diluted exhaust gas to set the split flow ratio (Q samp /Q CVS ) so as to make a flow velocity (V filter ) of the diluted exhaust gas flowing into the analytical device 10 equal to a predetermined value. |
| format | Patent |
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the CVS 5 provided in the main flow path 4; a diluted exhaust gas sampling flow path 6 for sampling part of the diluted exhaust gas from the main flow path 4 to introduce the part into the analytical device 10; a flow rate control mechanism 7 that controls a flow rate of the diluted exhaust gas to be sampled through the diluted exhaust gas sampling flow path 6; and a control device 8 that sets a split flow ratio that is a ratio of the flow rate of the diluted exhaust gas to be sampled through the diluted exhaust gas sampling flow path 6 to a flow rate of the diluted exhaust gas flowing through the CVS 5, wherein the control device 8 uses the flow rate (Q CVS ) of the diluted exhaust gas flowing through the CVS 5 or a value (T CVS or P CVS ) related to the flow rate (Qcvs) of the diluted exhaust gas to set the split flow ratio (Q samp /Q CVS ) so as to make a flow velocity (V filter ) of the diluted exhaust gas flowing into the analytical device 10 equal to a predetermined value.</description><language>eng ; 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the CVS 5 provided in the main flow path 4; a diluted exhaust gas sampling flow path 6 for sampling part of the diluted exhaust gas from the main flow path 4 to introduce the part into the analytical device 10; a flow rate control mechanism 7 that controls a flow rate of the diluted exhaust gas to be sampled through the diluted exhaust gas sampling flow path 6; and a control device 8 that sets a split flow ratio that is a ratio of the flow rate of the diluted exhaust gas to be sampled through the diluted exhaust gas sampling flow path 6 to a flow rate of the diluted exhaust gas flowing through the CVS 5, wherein the control device 8 uses the flow rate (Q CVS ) of the diluted exhaust gas flowing through the CVS 5 or a value (T CVS or P CVS ) related to the flow rate (Qcvs) of the diluted exhaust gas to set the split flow ratio (Q samp /Q CVS ) so as to make a flow velocity (V filter ) of the diluted exhaust gas flowing into the analytical device 10 equal to a predetermined value.</description><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASURING</subject><subject>PHYSICS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJBzrchILC0uUUhPLFYoTswtyMnMS1dILChILEosKS3mYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxrgFG5uZG5iYmTobGRCgBAMUmJFo</recordid><startdate>20190703</startdate><enddate>20190703</enddate><creator>Asami, Tetsuji</creator><creator>Nishimoto, Akihiro</creator><creator>Hisamori, Yosuke</creator><scope>EVB</scope></search><sort><creationdate>20190703</creationdate><title>Exhaust gas sampling apparatus</title><author>Asami, Tetsuji ; 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the CVS 5 provided in the main flow path 4; a diluted exhaust gas sampling flow path 6 for sampling part of the diluted exhaust gas from the main flow path 4 to introduce the part into the analytical device 10; a flow rate control mechanism 7 that controls a flow rate of the diluted exhaust gas to be sampled through the diluted exhaust gas sampling flow path 6; and a control device 8 that sets a split flow ratio that is a ratio of the flow rate of the diluted exhaust gas to be sampled through the diluted exhaust gas sampling flow path 6 to a flow rate of the diluted exhaust gas flowing through the CVS 5, wherein the control device 8 uses the flow rate (Q CVS ) of the diluted exhaust gas flowing through the CVS 5 or a value (T CVS or P CVS ) related to the flow rate (Qcvs) of the diluted exhaust gas to set the split flow ratio (Q samp /Q CVS ) so as to make a flow velocity (V filter ) of the diluted exhaust gas flowing into the analytical device 10 equal to a predetermined value.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING |
| title | Exhaust gas sampling apparatus |
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