ELECTRICAL INSPECTION OF ELECTRONIC DEVICES USING ELECTRON-BEAM INDUCED PLASMA PROBES

A non-mechanical contact signal measurement apparatus includes a first conductor on a structure under test and a gas in contact with the first conductor. At least one electron beam is directed into the gas so as to induce a plasma in the gas where the electron beam passes through the gas. A second c...

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Hauptverfasser: KADAR, OFER, TOET, DANIEL, GLAZER, ARIE, LOEWINGER, RONEN, GROSS, ABRAHAM, KADYSHEVITCH, ALEXANDER
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TOET, DANIEL
GLAZER, ARIE
LOEWINGER, RONEN
GROSS, ABRAHAM
KADYSHEVITCH, ALEXANDER
description A non-mechanical contact signal measurement apparatus includes a first conductor on a structure under test and a gas in contact with the first conductor. At least one electron beam is directed into the gas so as to induce a plasma in the gas where the electron beam passes through the gas. A second conductor is in electrical contact with the plasma. A signal source is coupled to an electrical measurement device through the first conductor, the plasma, and the second conductor when the plasma is directed on the first conductor. The electrical measurement device is responsive to the signal source.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP2732299A4</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP2732299A4</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP2732299A43</originalsourceid><addsrcrecordid>eNrjZAh19XF1DgnydHb0UfD0Cw4Acjz9_RT83RQgEv5-ns4KLq5hns6uwQqhwZ5-7nAJXSdXR1-gJpdQZ1cXhQAfx2BfR4WAIH8n12AeBta0xJziVF4ozc2g4OYa4uyhm1qQH59aXJCYnJqXWhLvGmBkbmxkZGnpaGJMhBIAAZYwCw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ELECTRICAL INSPECTION OF ELECTRONIC DEVICES USING ELECTRON-BEAM INDUCED PLASMA PROBES</title><source>esp@cenet</source><creator>KADAR, OFER ; TOET, DANIEL ; GLAZER, ARIE ; LOEWINGER, RONEN ; GROSS, ABRAHAM ; KADYSHEVITCH, ALEXANDER</creator><creatorcontrib>KADAR, OFER ; TOET, DANIEL ; GLAZER, ARIE ; LOEWINGER, RONEN ; GROSS, ABRAHAM ; KADYSHEVITCH, ALEXANDER</creatorcontrib><description>A non-mechanical contact signal measurement apparatus includes a first conductor on a structure under test and a gas in contact with the first conductor. At least one electron beam is directed into the gas so as to induce a plasma in the gas where the electron beam passes through the gas. A second conductor is in electrical contact with the plasma. A signal source is coupled to an electrical measurement device through the first conductor, the plasma, and the second conductor when the plasma is directed on the first conductor. The electrical measurement device is responsive to the signal source.</description><language>eng ; fre ; ger</language><subject>MEASURING ; MEASURING ELECTRIC VARIABLES ; MEASURING MAGNETIC VARIABLES ; PHYSICS ; TESTING</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20150325&amp;DB=EPODOC&amp;CC=EP&amp;NR=2732299A4$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25566,76549</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20150325&amp;DB=EPODOC&amp;CC=EP&amp;NR=2732299A4$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KADAR, OFER</creatorcontrib><creatorcontrib>TOET, DANIEL</creatorcontrib><creatorcontrib>GLAZER, ARIE</creatorcontrib><creatorcontrib>LOEWINGER, RONEN</creatorcontrib><creatorcontrib>GROSS, ABRAHAM</creatorcontrib><creatorcontrib>KADYSHEVITCH, ALEXANDER</creatorcontrib><title>ELECTRICAL INSPECTION OF ELECTRONIC DEVICES USING ELECTRON-BEAM INDUCED PLASMA PROBES</title><description>A non-mechanical contact signal measurement apparatus includes a first conductor on a structure under test and a gas in contact with the first conductor. At least one electron beam is directed into the gas so as to induce a plasma in the gas where the electron beam passes through the gas. A second conductor is in electrical contact with the plasma. A signal source is coupled to an electrical measurement device through the first conductor, the plasma, and the second conductor when the plasma is directed on the first conductor. The electrical measurement device is responsive to the signal source.</description><subject>MEASURING</subject><subject>MEASURING ELECTRIC VARIABLES</subject><subject>MEASURING MAGNETIC VARIABLES</subject><subject>PHYSICS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAh19XF1DgnydHb0UfD0Cw4Acjz9_RT83RQgEv5-ns4KLq5hns6uwQqhwZ5-7nAJXSdXR1-gJpdQZ1cXhQAfx2BfR4WAIH8n12AeBta0xJziVF4ozc2g4OYa4uyhm1qQH59aXJCYnJqXWhLvGmBkbmxkZGnpaGJMhBIAAZYwCw</recordid><startdate>20150325</startdate><enddate>20150325</enddate><creator>KADAR, OFER</creator><creator>TOET, DANIEL</creator><creator>GLAZER, ARIE</creator><creator>LOEWINGER, RONEN</creator><creator>GROSS, ABRAHAM</creator><creator>KADYSHEVITCH, ALEXANDER</creator><scope>EVB</scope></search><sort><creationdate>20150325</creationdate><title>ELECTRICAL INSPECTION OF ELECTRONIC DEVICES USING ELECTRON-BEAM INDUCED PLASMA PROBES</title><author>KADAR, OFER ; TOET, DANIEL ; GLAZER, ARIE ; LOEWINGER, RONEN ; GROSS, ABRAHAM ; KADYSHEVITCH, ALEXANDER</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP2732299A43</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2015</creationdate><topic>MEASURING</topic><topic>MEASURING ELECTRIC VARIABLES</topic><topic>MEASURING MAGNETIC VARIABLES</topic><topic>PHYSICS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>KADAR, OFER</creatorcontrib><creatorcontrib>TOET, DANIEL</creatorcontrib><creatorcontrib>GLAZER, ARIE</creatorcontrib><creatorcontrib>LOEWINGER, RONEN</creatorcontrib><creatorcontrib>GROSS, ABRAHAM</creatorcontrib><creatorcontrib>KADYSHEVITCH, ALEXANDER</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KADAR, OFER</au><au>TOET, DANIEL</au><au>GLAZER, ARIE</au><au>LOEWINGER, RONEN</au><au>GROSS, ABRAHAM</au><au>KADYSHEVITCH, ALEXANDER</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ELECTRICAL INSPECTION OF ELECTRONIC DEVICES USING ELECTRON-BEAM INDUCED PLASMA PROBES</title><date>2015-03-25</date><risdate>2015</risdate><abstract>A non-mechanical contact signal measurement apparatus includes a first conductor on a structure under test and a gas in contact with the first conductor. At least one electron beam is directed into the gas so as to induce a plasma in the gas where the electron beam passes through the gas. A second conductor is in electrical contact with the plasma. A signal source is coupled to an electrical measurement device through the first conductor, the plasma, and the second conductor when the plasma is directed on the first conductor. The electrical measurement device is responsive to the signal source.</abstract><oa>free_for_read</oa></addata></record>
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subjects MEASURING
MEASURING ELECTRIC VARIABLES
MEASURING MAGNETIC VARIABLES
PHYSICS
TESTING
title ELECTRICAL INSPECTION OF ELECTRONIC DEVICES USING ELECTRON-BEAM INDUCED PLASMA PROBES
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-18T10%3A54%3A53IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KADAR,%20OFER&rft.date=2015-03-25&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP2732299A4%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true