Dynamic multi-purpose composition for the removal of photoresists
Improved dry stripper solutions for removing one, two or more photoresist layers from substrates are provided. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine, an optional secondary solvent and less than about 3 wt.% water and/or a dryness coe...
Gespeichert in:
| Hauptverfasser: | , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; fre ; ger |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | JOHNSON, LAURI RENEE PHENIS, MICHAEL, T POLLARD, KIMBERLY, DONA CHAN, RAYMOND SCHEELE, DIANE, MARIE GOEBEL, GENE |
| description | Improved dry stripper solutions for removing one, two or more photoresist layers from substrates are provided. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine, an optional secondary solvent and less than about 3 wt.% water and/or a dryness coefficient of at least about 1. Methods for the preparation and use of the improved dry stripping solutions are additionally provided. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP2657771A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP2657771A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP2657771A13</originalsourceid><addsrcrecordid>eNqNyjEOwjAMAMAsDAj4gz_QoSDIXJUiRgb2Kooc1VISW7GLxO9h4AFMt9zWDdd3DYUilDUbdbI2YUWIXL6SEVdI3MAWhIaFXyEDJ5CFjRsqqenebVLIioefOwe36TneOxSeUSVErGjz9Dhezt77fuhPf5QP_tcyHw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Dynamic multi-purpose composition for the removal of photoresists</title><source>esp@cenet</source><creator>JOHNSON, LAURI RENEE ; PHENIS, MICHAEL, T ; POLLARD, KIMBERLY, DONA ; CHAN, RAYMOND ; SCHEELE, DIANE, MARIE ; GOEBEL, GENE</creator><creatorcontrib>JOHNSON, LAURI RENEE ; PHENIS, MICHAEL, T ; POLLARD, KIMBERLY, DONA ; CHAN, RAYMOND ; SCHEELE, DIANE, MARIE ; GOEBEL, GENE</creatorcontrib><description>Improved dry stripper solutions for removing one, two or more photoresist layers from substrates are provided. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine, an optional secondary solvent and less than about 3 wt.% water and/or a dryness coefficient of at least about 1. Methods for the preparation and use of the improved dry stripping solutions are additionally provided.</description><language>eng ; fre ; ger</language><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CANDLES ; CHEMISTRY ; CINEMATOGRAPHY ; DETERGENT COMPOSITIONS ; DETERGENTS ; ELECTROGRAPHY ; FATTY ACIDS THEREFROM ; HOLOGRAPHY ; MATERIALS THEREFOR ; METALLURGY ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; RECOVERY OF GLYCEROL ; RESIN SOAPS ; SOAP OR SOAP-MAKING ; USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20131030&DB=EPODOC&CC=EP&NR=2657771A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76419</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20131030&DB=EPODOC&CC=EP&NR=2657771A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JOHNSON, LAURI RENEE</creatorcontrib><creatorcontrib>PHENIS, MICHAEL, T</creatorcontrib><creatorcontrib>POLLARD, KIMBERLY, DONA</creatorcontrib><creatorcontrib>CHAN, RAYMOND</creatorcontrib><creatorcontrib>SCHEELE, DIANE, MARIE</creatorcontrib><creatorcontrib>GOEBEL, GENE</creatorcontrib><title>Dynamic multi-purpose composition for the removal of photoresists</title><description>Improved dry stripper solutions for removing one, two or more photoresist layers from substrates are provided. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine, an optional secondary solvent and less than about 3 wt.% water and/or a dryness coefficient of at least about 1. Methods for the preparation and use of the improved dry stripping solutions are additionally provided.</description><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CANDLES</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>DETERGENT COMPOSITIONS</subject><subject>DETERGENTS</subject><subject>ELECTROGRAPHY</subject><subject>FATTY ACIDS THEREFROM</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>RECOVERY OF GLYCEROL</subject><subject>RESIN SOAPS</subject><subject>SOAP OR SOAP-MAKING</subject><subject>USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyjEOwjAMAMAsDAj4gz_QoSDIXJUiRgb2Kooc1VISW7GLxO9h4AFMt9zWDdd3DYUilDUbdbI2YUWIXL6SEVdI3MAWhIaFXyEDJ5CFjRsqqenebVLIioefOwe36TneOxSeUSVErGjz9Dhezt77fuhPf5QP_tcyHw</recordid><startdate>20131030</startdate><enddate>20131030</enddate><creator>JOHNSON, LAURI RENEE</creator><creator>PHENIS, MICHAEL, T</creator><creator>POLLARD, KIMBERLY, DONA</creator><creator>CHAN, RAYMOND</creator><creator>SCHEELE, DIANE, MARIE</creator><creator>GOEBEL, GENE</creator><scope>EVB</scope></search><sort><creationdate>20131030</creationdate><title>Dynamic multi-purpose composition for the removal of photoresists</title><author>JOHNSON, LAURI RENEE ; PHENIS, MICHAEL, T ; POLLARD, KIMBERLY, DONA ; CHAN, RAYMOND ; SCHEELE, DIANE, MARIE ; GOEBEL, GENE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP2657771A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2013</creationdate><topic>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CANDLES</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>DETERGENT COMPOSITIONS</topic><topic>DETERGENTS</topic><topic>ELECTROGRAPHY</topic><topic>FATTY ACIDS THEREFROM</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>RECOVERY OF GLYCEROL</topic><topic>RESIN SOAPS</topic><topic>SOAP OR SOAP-MAKING</topic><topic>USE OF SINGLE SUBSTANCES AS DETERGENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>JOHNSON, LAURI RENEE</creatorcontrib><creatorcontrib>PHENIS, MICHAEL, T</creatorcontrib><creatorcontrib>POLLARD, KIMBERLY, DONA</creatorcontrib><creatorcontrib>CHAN, RAYMOND</creatorcontrib><creatorcontrib>SCHEELE, DIANE, MARIE</creatorcontrib><creatorcontrib>GOEBEL, GENE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>JOHNSON, LAURI RENEE</au><au>PHENIS, MICHAEL, T</au><au>POLLARD, KIMBERLY, DONA</au><au>CHAN, RAYMOND</au><au>SCHEELE, DIANE, MARIE</au><au>GOEBEL, GENE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Dynamic multi-purpose composition for the removal of photoresists</title><date>2013-10-30</date><risdate>2013</risdate><abstract>Improved dry stripper solutions for removing one, two or more photoresist layers from substrates are provided. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine, an optional secondary solvent and less than about 3 wt.% water and/or a dryness coefficient of at least about 1. Methods for the preparation and use of the improved dry stripping solutions are additionally provided.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; fre ; ger |
| recordid | cdi_epo_espacenet_EP2657771A1 |
| source | esp@cenet |
| subjects | ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES APPARATUS SPECIALLY ADAPTED THEREFOR CANDLES CHEMISTRY CINEMATOGRAPHY DETERGENT COMPOSITIONS DETERGENTS ELECTROGRAPHY FATTY ACIDS THEREFROM HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RECOVERY OF GLYCEROL RESIN SOAPS SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS |
| title | Dynamic multi-purpose composition for the removal of photoresists |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-07T21%3A40%3A21IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=JOHNSON,%20LAURI%20RENEE&rft.date=2013-10-30&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP2657771A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |