METHOD FOR SUPPLYING A PLURALITY OF REACTIVE PROCESS GASES TO A PROCESS LOCATION OF A PARTICLE BEAM SYSTEM

A system for supplying a process gas to a processing location 7 of a particle beam system 1 comprises a gas reservoir 63; a gas conduit 65; a pipe 69 located close to the processing location; a valve 67 provided between the gas conduit and the pipe; and a controller 71 configured to open and to clos...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Zeile, Ulrike, Knappich, Matthias
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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