container_end_page
container_issue
container_start_page
container_title
container_volume
creator CIGAL, JEANARLES
HWANG, YING-SIANG
STOCKMAN, PAUL ALAN
PETRI, STEFAN
HOGLE, RICHARD
description
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP2608900A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP2608900A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP2608900A13</originalsourceid><addsrcrecordid>eNrjZHBy9nD19XR29FEIcwzwD1JwcQ3wD_YM8fT3U3D2cPR1cg1ScPZxdfTz9HNXCPcM8VDw9fdxdQ71cQxScPMJ9Q_y9HPlYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxrgFGZgYWlgYGjobGRCgBAK6WKtY</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>CHEMICAL VAPOR DEPOSITION CHAMBER CLEANING WITH MOLECULAR FLUORINE</title><source>esp@cenet</source><creator>CIGAL, JEANARLES ; HWANG, YING-SIANG ; STOCKMAN, PAUL ALAN ; PETRI, STEFAN ; HOGLE, RICHARD</creator><creatorcontrib>CIGAL, JEANARLES ; HWANG, YING-SIANG ; STOCKMAN, PAUL ALAN ; PETRI, STEFAN ; HOGLE, RICHARD</creatorcontrib><language>eng ; fre ; ger</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; CLEANING ; CLEANING IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PERFORMING OPERATIONS ; PREVENTION OF FOULING IN GENERAL ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TRANSPORTING</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20130703&amp;DB=EPODOC&amp;CC=EP&amp;NR=2608900A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20130703&amp;DB=EPODOC&amp;CC=EP&amp;NR=2608900A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CIGAL, JEANARLES</creatorcontrib><creatorcontrib>HWANG, YING-SIANG</creatorcontrib><creatorcontrib>STOCKMAN, PAUL ALAN</creatorcontrib><creatorcontrib>PETRI, STEFAN</creatorcontrib><creatorcontrib>HOGLE, RICHARD</creatorcontrib><title>CHEMICAL VAPOR DEPOSITION CHAMBER CLEANING WITH MOLECULAR FLUORINE</title><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PERFORMING OPERATIONS</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHBy9nD19XR29FEIcwzwD1JwcQ3wD_YM8fT3U3D2cPR1cg1ScPZxdfTz9HNXCPcM8VDw9fdxdQ71cQxScPMJ9Q_y9HPlYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxrgFGZgYWlgYGjobGRCgBAK6WKtY</recordid><startdate>20130703</startdate><enddate>20130703</enddate><creator>CIGAL, JEANARLES</creator><creator>HWANG, YING-SIANG</creator><creator>STOCKMAN, PAUL ALAN</creator><creator>PETRI, STEFAN</creator><creator>HOGLE, RICHARD</creator><scope>EVB</scope></search><sort><creationdate>20130703</creationdate><title>CHEMICAL VAPOR DEPOSITION CHAMBER CLEANING WITH MOLECULAR FLUORINE</title><author>CIGAL, JEANARLES ; HWANG, YING-SIANG ; STOCKMAN, PAUL ALAN ; PETRI, STEFAN ; HOGLE, RICHARD</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP2608900A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2013</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PERFORMING OPERATIONS</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>CIGAL, JEANARLES</creatorcontrib><creatorcontrib>HWANG, YING-SIANG</creatorcontrib><creatorcontrib>STOCKMAN, PAUL ALAN</creatorcontrib><creatorcontrib>PETRI, STEFAN</creatorcontrib><creatorcontrib>HOGLE, RICHARD</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CIGAL, JEANARLES</au><au>HWANG, YING-SIANG</au><au>STOCKMAN, PAUL ALAN</au><au>PETRI, STEFAN</au><au>HOGLE, RICHARD</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CHEMICAL VAPOR DEPOSITION CHAMBER CLEANING WITH MOLECULAR FLUORINE</title><date>2013-07-03</date><risdate>2013</risdate><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng ; fre ; ger
recordid cdi_epo_espacenet_EP2608900A1
source esp@cenet
subjects CHEMICAL SURFACE TREATMENT
CHEMISTRY
CLEANING
CLEANING IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
TRANSPORTING
title CHEMICAL VAPOR DEPOSITION CHAMBER CLEANING WITH MOLECULAR FLUORINE
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-28T13%3A08%3A23IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=CIGAL,%20JEANARLES&rft.date=2013-07-03&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP2608900A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true