Lateral avalanche photodiode device and method of production

A lateral avalanche device comprises a semiconductor substrate (1) having a trench (4) with side walls (5) extending from a main surface (2) to a rear surface (3). A first doped region (11) is present at the side walls of the trench, and a second doped region (12) is arranged at a distance from the...

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Bibliographische Detailangaben
Hauptverfasser: Teva, Jordi, Jonak-Auer, Ingrid
Format: Patent
Sprache:eng ; fre ; ger
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