METHOD FOR VACUUM-COATING A SUBSTRATE WITH A TRANSPARENT, CONDUCTIVE METAL ALLOY OXIDE AND A TRANSPARENT, CONDUCTIVE LAYER MADE OF A METAL ALLOY OXIDE

The invention relates to a method for depositing a transparent, conductive layer, comprising a host material and a doping material, on a substrate (2) within a vacuum chamber (1), wherein the host material is made of zinc oxide or indium oxide and the doping material comprises an oxide of at least o...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SCHÖNBERGER, Alexander, SCHÖNBERGER, Waldemar, STRAACH, Steffen, SCHILLER, Nicolas, FAHLAND, Matthias
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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