SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

A method of manufacturing a semiconductor device is provided in which a substrate is thinned and a semiconductor region made of a fine pattern is formed. The method of manufacturing of a semiconductor device (101) includes: a fine pattern forming step of forming p-type impurity regions (3, 4) and su...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SAKAGUCHI, YASUYUKI, SUGAI, AKIHIKO
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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