ARRANGEMENT FOR COATING TAPE-SHAPED FILM SUBSTRATES

The arrangement for coating band-shaped film substrates, comprises wind-off (7) and take-up rollers (8) guided between the substrates under a strip tensile stress and a coating station arranged between the rollers and comprising two coating sources (5) in the area of a coil coating process, in which...

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Bibliographische Detailangaben
Hauptverfasser:	GOTTSMANN, LUTZ, PROEHL, HOLGER
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The arrangement for coating band-shaped film substrates, comprises wind-off (7) and take-up rollers (8) guided between the substrates under a strip tensile stress and a coating station arranged between the rollers and comprising two coating sources (5) in the area of a coil coating process, in which the strip is guided between the wind-off roller and take-up roller. The coating sources are arranged toward the strip flow one behind the other and in a coating side of the film substrate. A supporting element is arranged between the sources on a rear side (11) of the substrate. The arrangement for coating band-shaped film substrates, comprises wind-off (7) and take-up rollers (8) guided between the substrates under a strip tensile stress and a coating station arranged between the rollers and comprising two coating sources (5) in the area of a coil coating process, in which the strip is guided between the wind-off roller and take-up roller. The coating sources are arranged toward the strip flow one behind the other and in a coating side of the film substrate. A supporting element is arranged between the sources on a rear side (11) of the substrate and produces the supporting force, which results the strip tensile stress. The substrate is freely strained between two supporting elements. More than two coating elements and corresponding supporting elements are arranged. The substrate has a polygonal surface in cross section. A heat absorption element (6) is arranged in the area of two coating sources. A supporting element is formed with supporting rolls (3) present in its axis of rotation transverse to the direction of motion of the substrate. The supporting rolls are formed as cooling roll from a cooling agent or as spherically shaped stretcher roller. The supporting element is formed as: a sliding block lying transverse to the direction of motion of the substrate; a gas flow element producing an air circulation between the rear side and the supporting element; and a magnet element or electrostatic element arranged at a distance between the rear side of the substrate and the supporting element.