GLASS -TYPE SUBSTRATE COATED WITH THIN LAYERS AND PRODUCTION METHOD

GLASS -TYPE SUBSTRATE COATED WITH THIN LAYERS AND PRODUCTION METHOD

The substrate has a conductive layer with thickness ranging between 200 and 1000 nanometers, and an upper layer with refraction index ranging between 1.45 and 2.2. Thickness of the upper layer ranges between 5 and 300 nanometers, where substrate and a stack of thin layers are arranged in such a mann...

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Bibliographische Detailangaben
Hauptverfasser: COSTER, DOMINIQUE, DECROUPET, DANIEL, SCHUTZ, ALAIN, RUELLE, JEAN-FRANCOIS, DOGNIES, XAVIER, JACOT, PIETER
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:The substrate has a conductive layer with thickness ranging between 200 and 1000 nanometers, and an upper layer with refraction index ranging between 1.45 and 2.2. Thickness of the upper layer ranges between 5 and 300 nanometers, where substrate and a stack of thin layers are arranged in such a manner that the light transmission value between 450 and 850 nanometers is higher than 70 percentage. The stack of thin layers comprises a sub-layer made of titanium oxide. An additional layer is placed on the upper layer. An intermediate layer is placed between the sub-layer and the conductive layer. An independent claim is also included for a method for fabrication of a substrate.