method and apparatus for active resource monitoring in a numerical control process

Active resource control of added functionality in a numerical control process having at least one resource is provided. It can occur during run-time of the numerical control process, that an added functionality that uses at least a portion of the resource. On-line checking of the added functionality...

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Hauptverfasser: DIRNFELDNER, RAINER, KAEVER, MICHAEL
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creator DIRNFELDNER, RAINER
KAEVER, MICHAEL
description Active resource control of added functionality in a numerical control process having at least one resource is provided. It can occur during run-time of the numerical control process, that an added functionality that uses at least a portion of the resource. On-line checking of the added functionality detects during run time whether the added functionality causes the numerical control process to reach a resource limit. Error handling handles errors upon reaching a resource limit. Off-line checking detects off-line, before the run time of the numerical control process, whether the added functionality causes the numerical control process to reach a resource limit of the resource. Multiple layers are provided that check at multiple layers of the numerical control process whether the added functionality causes the numerical control process to reach a resource limit of the resource. A flexible response to resource limit errors based on a degree of importance of the added functionality is provided.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP2254015A3</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP2254015A3</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP2254015A33</originalsourceid><addsrcrecordid>eNqNyjEKAkEMQNFpLES9Qy4g6K57AJEVSxH7JcSsDswkQzLj-bXwABaf1_xluGWuL30AyrdS0LA2h1kNkGp8Mxi7NiOGrBKrWpQnRAEEaZktEiYglWqaoJgSu6_DYsbkvPm5CnAe76fLlotO7AWJhes0XrtuOOz2w7Hv_1g-4JQ4GQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>method and apparatus for active resource monitoring in a numerical control process</title><source>esp@cenet</source><creator>DIRNFELDNER, RAINER ; KAEVER, MICHAEL</creator><creatorcontrib>DIRNFELDNER, RAINER ; KAEVER, MICHAEL</creatorcontrib><description>Active resource control of added functionality in a numerical control process having at least one resource is provided. It can occur during run-time of the numerical control process, that an added functionality that uses at least a portion of the resource. On-line checking of the added functionality detects during run time whether the added functionality causes the numerical control process to reach a resource limit. Error handling handles errors upon reaching a resource limit. Off-line checking detects off-line, before the run time of the numerical control process, whether the added functionality causes the numerical control process to reach a resource limit of the resource. Multiple layers are provided that check at multiple layers of the numerical control process whether the added functionality causes the numerical control process to reach a resource limit of the resource. A flexible response to resource limit errors based on a degree of importance of the added functionality is provided.</description><language>eng ; fre ; ger</language><subject>CONTROL OR REGULATING SYSTEMS IN GENERAL ; CONTROLLING ; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS ; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ; PHYSICS ; REGULATING</subject><creationdate>2010</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20101215&amp;DB=EPODOC&amp;CC=EP&amp;NR=2254015A3$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20101215&amp;DB=EPODOC&amp;CC=EP&amp;NR=2254015A3$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>DIRNFELDNER, RAINER</creatorcontrib><creatorcontrib>KAEVER, MICHAEL</creatorcontrib><title>method and apparatus for active resource monitoring in a numerical control process</title><description>Active resource control of added functionality in a numerical control process having at least one resource is provided. It can occur during run-time of the numerical control process, that an added functionality that uses at least a portion of the resource. On-line checking of the added functionality detects during run time whether the added functionality causes the numerical control process to reach a resource limit. Error handling handles errors upon reaching a resource limit. Off-line checking detects off-line, before the run time of the numerical control process, whether the added functionality causes the numerical control process to reach a resource limit of the resource. Multiple layers are provided that check at multiple layers of the numerical control process whether the added functionality causes the numerical control process to reach a resource limit of the resource. A flexible response to resource limit errors based on a degree of importance of the added functionality is provided.</description><subject>CONTROL OR REGULATING SYSTEMS IN GENERAL</subject><subject>CONTROLLING</subject><subject>FUNCTIONAL ELEMENTS OF SUCH SYSTEMS</subject><subject>MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS</subject><subject>PHYSICS</subject><subject>REGULATING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2010</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyjEKAkEMQNFpLES9Qy4g6K57AJEVSxH7JcSsDswkQzLj-bXwABaf1_xluGWuL30AyrdS0LA2h1kNkGp8Mxi7NiOGrBKrWpQnRAEEaZktEiYglWqaoJgSu6_DYsbkvPm5CnAe76fLlotO7AWJhes0XrtuOOz2w7Hv_1g-4JQ4GQ</recordid><startdate>20101215</startdate><enddate>20101215</enddate><creator>DIRNFELDNER, RAINER</creator><creator>KAEVER, MICHAEL</creator><scope>EVB</scope></search><sort><creationdate>20101215</creationdate><title>method and apparatus for active resource monitoring in a numerical control process</title><author>DIRNFELDNER, RAINER ; KAEVER, MICHAEL</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP2254015A33</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2010</creationdate><topic>CONTROL OR REGULATING SYSTEMS IN GENERAL</topic><topic>CONTROLLING</topic><topic>FUNCTIONAL ELEMENTS OF SUCH SYSTEMS</topic><topic>MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS</topic><topic>PHYSICS</topic><topic>REGULATING</topic><toplevel>online_resources</toplevel><creatorcontrib>DIRNFELDNER, RAINER</creatorcontrib><creatorcontrib>KAEVER, MICHAEL</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>DIRNFELDNER, RAINER</au><au>KAEVER, MICHAEL</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>method and apparatus for active resource monitoring in a numerical control process</title><date>2010-12-15</date><risdate>2010</risdate><abstract>Active resource control of added functionality in a numerical control process having at least one resource is provided. It can occur during run-time of the numerical control process, that an added functionality that uses at least a portion of the resource. On-line checking of the added functionality detects during run time whether the added functionality causes the numerical control process to reach a resource limit. Error handling handles errors upon reaching a resource limit. Off-line checking detects off-line, before the run time of the numerical control process, whether the added functionality causes the numerical control process to reach a resource limit of the resource. Multiple layers are provided that check at multiple layers of the numerical control process whether the added functionality causes the numerical control process to reach a resource limit of the resource. A flexible response to resource limit errors based on a degree of importance of the added functionality is provided.</abstract><oa>free_for_read</oa></addata></record>
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subjects CONTROL OR REGULATING SYSTEMS IN GENERAL
CONTROLLING
FUNCTIONAL ELEMENTS OF SUCH SYSTEMS
MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS
PHYSICS
REGULATING
title method and apparatus for active resource monitoring in a numerical control process
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-10T09%3A43%3A34IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=DIRNFELDNER,%20RAINER&rft.date=2010-12-15&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP2254015A3%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true