METHODS FOR FORMATION OF SUBSTRATE ELEMENTS

The present invention relates to methods of forming substrate elements, including semiconductor elements such as nanowires, transistors and other structures, as well as the elements formed by such methods.

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Hauptverfasser: LEON, FRANCISCO, LEMMI, FRANCESCO, STUMBO, DAVID, P, DUTTON, DAVID, MILLER, JEFFREY
Format: Patent
Sprache:eng ; fre ; ger
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creator LEON, FRANCISCO
LEMMI, FRANCESCO
STUMBO, DAVID, P
DUTTON, DAVID
MILLER, JEFFREY
description The present invention relates to methods of forming substrate elements, including semiconductor elements such as nanowires, transistors and other structures, as well as the elements formed by such methods.
format Patent
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language eng ; fre ; ger
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES
NANOTECHNOLOGY
PERFORMING OPERATIONS
SEMICONDUCTOR DEVICES
SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
TRANSPORTING
title METHODS FOR FORMATION OF SUBSTRATE ELEMENTS
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