Electrodialysis method for purifying of silicate-containing potassium hydroxide etching solution
An electrodialysis method for the treatment of silicate-containing potassium hydroxide etching waste solution is provided. The method comprises: providing a reaction tank including a cathode, an anode, and two cation dialysis membranes, wherein the reaction tank is divided by the cation dialysis mem...
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| creator | CHANG, GOANGNG YANG, WEI-LIANG DOVE, CURTIS DOUGLAS |
| description | An electrodialysis method for the treatment of silicate-containing potassium hydroxide etching waste solution is provided. The method comprises: providing a reaction tank including a cathode, an anode, and two cation dialysis membranes, wherein the reaction tank is divided by the cation dialysis membranes into a cathode chamber, an anode chamber and a waste solution disposing chamber located therebetween; filling a sulfuric acid solution into the anode chamber; filling a potassium hydroxide solution into the cathode chamber; introducing a silicate-containing potassium hydroxide etching waste solution into the waste solution disposing chamber; and applying a voltage and a current density to each of the chambers to render potassium ions to transport from the waste solution chamber through the cation dialysis membrane to the cathode chamber. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP2228123B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP2228123B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP2228123B13</originalsourceid><addsrcrecordid>eNqNijEOwjAMALswIOAP_kCHpgszKIiRgb1EiUMspXEUuxL9ParEA5hOurt997IZvTYO5PIqJDCjJg4QuUFdGsWVyhs4glAm7xR7z0UdlU1XVidCywxpDY0_FBBQfdqacF6UuBy7XXRZ8PTjoYObfV7vPVaeUKrzWFAn-zDGnAczXobxj-ULDZE-XA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Electrodialysis method for purifying of silicate-containing potassium hydroxide etching solution</title><source>esp@cenet</source><creator>CHANG, GOANGNG ; YANG, WEI-LIANG ; DOVE, CURTIS DOUGLAS</creator><creatorcontrib>CHANG, GOANGNG ; YANG, WEI-LIANG ; DOVE, CURTIS DOUGLAS</creatorcontrib><description>An electrodialysis method for the treatment of silicate-containing potassium hydroxide etching waste solution is provided. The method comprises: providing a reaction tank including a cathode, an anode, and two cation dialysis membranes, wherein the reaction tank is divided by the cation dialysis membranes into a cathode chamber, an anode chamber and a waste solution disposing chamber located therebetween; filling a sulfuric acid solution into the anode chamber; filling a potassium hydroxide solution into the cathode chamber; introducing a silicate-containing potassium hydroxide etching waste solution into the waste solution disposing chamber; and applying a voltage and a current density to each of the chambers to render potassium ions to transport from the waste solution chamber through the cation dialysis membrane to the cathode chamber.</description><language>eng ; fre ; ger</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; COMPOUNDS THEREOF ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; INORGANIC CHEMISTRY ; METALLURGY ; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 ; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE ; NON-METALLIC ELEMENTS ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; SEPARATION ; TRANSPORTING ; TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140820&DB=EPODOC&CC=EP&NR=2228123B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76419</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140820&DB=EPODOC&CC=EP&NR=2228123B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHANG, GOANGNG</creatorcontrib><creatorcontrib>YANG, WEI-LIANG</creatorcontrib><creatorcontrib>DOVE, CURTIS DOUGLAS</creatorcontrib><title>Electrodialysis method for purifying of silicate-containing potassium hydroxide etching solution</title><description>An electrodialysis method for the treatment of silicate-containing potassium hydroxide etching waste solution is provided. The method comprises: providing a reaction tank including a cathode, an anode, and two cation dialysis membranes, wherein the reaction tank is divided by the cation dialysis membranes into a cathode chamber, an anode chamber and a waste solution disposing chamber located therebetween; filling a sulfuric acid solution into the anode chamber; filling a potassium hydroxide solution into the cathode chamber; introducing a silicate-containing potassium hydroxide etching waste solution into the waste solution disposing chamber; and applying a voltage and a current density to each of the chambers to render potassium ions to transport from the waste solution chamber through the cation dialysis membrane to the cathode chamber.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>COMPOUNDS THEREOF</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>INORGANIC CHEMISTRY</subject><subject>METALLURGY</subject><subject>MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25</subject><subject>NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</subject><subject>NON-METALLIC ELEMENTS</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>SEPARATION</subject><subject>TRANSPORTING</subject><subject>TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNijEOwjAMALswIOAP_kCHpgszKIiRgb1EiUMspXEUuxL9ParEA5hOurt997IZvTYO5PIqJDCjJg4QuUFdGsWVyhs4glAm7xR7z0UdlU1XVidCywxpDY0_FBBQfdqacF6UuBy7XXRZ8PTjoYObfV7vPVaeUKrzWFAn-zDGnAczXobxj-ULDZE-XA</recordid><startdate>20140820</startdate><enddate>20140820</enddate><creator>CHANG, GOANGNG</creator><creator>YANG, WEI-LIANG</creator><creator>DOVE, CURTIS DOUGLAS</creator><scope>EVB</scope></search><sort><creationdate>20140820</creationdate><title>Electrodialysis method for purifying of silicate-containing potassium hydroxide etching solution</title><author>CHANG, GOANGNG ; YANG, WEI-LIANG ; DOVE, CURTIS DOUGLAS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP2228123B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2014</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>COMPOUNDS THEREOF</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>INORGANIC CHEMISTRY</topic><topic>METALLURGY</topic><topic>MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25</topic><topic>NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</topic><topic>NON-METALLIC ELEMENTS</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>SEPARATION</topic><topic>TRANSPORTING</topic><topic>TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE</topic><toplevel>online_resources</toplevel><creatorcontrib>CHANG, GOANGNG</creatorcontrib><creatorcontrib>YANG, WEI-LIANG</creatorcontrib><creatorcontrib>DOVE, CURTIS DOUGLAS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHANG, GOANGNG</au><au>YANG, WEI-LIANG</au><au>DOVE, CURTIS DOUGLAS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Electrodialysis method for purifying of silicate-containing potassium hydroxide etching solution</title><date>2014-08-20</date><risdate>2014</risdate><abstract>An electrodialysis method for the treatment of silicate-containing potassium hydroxide etching waste solution is provided. The method comprises: providing a reaction tank including a cathode, an anode, and two cation dialysis membranes, wherein the reaction tank is divided by the cation dialysis membranes into a cathode chamber, an anode chamber and a waste solution disposing chamber located therebetween; filling a sulfuric acid solution into the anode chamber; filling a potassium hydroxide solution into the cathode chamber; introducing a silicate-containing potassium hydroxide etching waste solution into the waste solution disposing chamber; and applying a voltage and a current density to each of the chambers to render potassium ions to transport from the waste solution chamber through the cation dialysis membrane to the cathode chamber.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng ; fre ; ger |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS THEREOF DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE NON-METALLIC ELEMENTS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION TRANSPORTING TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE |
| title | Electrodialysis method for purifying of silicate-containing potassium hydroxide etching solution |
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