PHOTOPATTERNABLE DEPOSITION INHIBITOR CONTAINING SILOXANE
Gespeichert in:
Hauptverfasser: | , , , , |
---|---|
Format: | Patent |
Sprache: | eng ; fre ; ger |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | YANG, CHENG FREEMAN, DIANE CAROL LEVY, DAVID HOWARD IRVING, LYN MARIE COWDERY-CORVAN, PETER JEROME |
description | |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP2212747B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP2212747B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP2212747B13</originalsourceid><addsrcrecordid>eNrjZLAM8PAP8Q9wDAlxDfJzdPJxVXBxDfAP9gzx9PdT8PTz8HTyDPEPUnD29wtx9PTz9HNXCPb08Y9w9HPlYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxrgFGRoZG5ibmTobGRCgBAIQAKOs</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PHOTOPATTERNABLE DEPOSITION INHIBITOR CONTAINING SILOXANE</title><source>esp@cenet</source><creator>YANG, CHENG ; FREEMAN, DIANE CAROL ; LEVY, DAVID HOWARD ; IRVING, LYN MARIE ; COWDERY-CORVAN, PETER JEROME</creator><creatorcontrib>YANG, CHENG ; FREEMAN, DIANE CAROL ; LEVY, DAVID HOWARD ; IRVING, LYN MARIE ; COWDERY-CORVAN, PETER JEROME</creatorcontrib><language>eng ; fre ; ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150722&DB=EPODOC&CC=EP&NR=2212747B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150722&DB=EPODOC&CC=EP&NR=2212747B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YANG, CHENG</creatorcontrib><creatorcontrib>FREEMAN, DIANE CAROL</creatorcontrib><creatorcontrib>LEVY, DAVID HOWARD</creatorcontrib><creatorcontrib>IRVING, LYN MARIE</creatorcontrib><creatorcontrib>COWDERY-CORVAN, PETER JEROME</creatorcontrib><title>PHOTOPATTERNABLE DEPOSITION INHIBITOR CONTAINING SILOXANE</title><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLAM8PAP8Q9wDAlxDfJzdPJxVXBxDfAP9gzx9PdT8PTz8HTyDPEPUnD29wtx9PTz9HNXCPb08Y9w9HPlYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxrgFGRoZG5ibmTobGRCgBAIQAKOs</recordid><startdate>20150722</startdate><enddate>20150722</enddate><creator>YANG, CHENG</creator><creator>FREEMAN, DIANE CAROL</creator><creator>LEVY, DAVID HOWARD</creator><creator>IRVING, LYN MARIE</creator><creator>COWDERY-CORVAN, PETER JEROME</creator><scope>EVB</scope></search><sort><creationdate>20150722</creationdate><title>PHOTOPATTERNABLE DEPOSITION INHIBITOR CONTAINING SILOXANE</title><author>YANG, CHENG ; FREEMAN, DIANE CAROL ; LEVY, DAVID HOWARD ; IRVING, LYN MARIE ; COWDERY-CORVAN, PETER JEROME</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP2212747B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2015</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>YANG, CHENG</creatorcontrib><creatorcontrib>FREEMAN, DIANE CAROL</creatorcontrib><creatorcontrib>LEVY, DAVID HOWARD</creatorcontrib><creatorcontrib>IRVING, LYN MARIE</creatorcontrib><creatorcontrib>COWDERY-CORVAN, PETER JEROME</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YANG, CHENG</au><au>FREEMAN, DIANE CAROL</au><au>LEVY, DAVID HOWARD</au><au>IRVING, LYN MARIE</au><au>COWDERY-CORVAN, PETER JEROME</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOPATTERNABLE DEPOSITION INHIBITOR CONTAINING SILOXANE</title><date>2015-07-22</date><risdate>2015</risdate><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng ; fre ; ger |
recordid | cdi_epo_espacenet_EP2212747B1 |
source | esp@cenet |
subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
title | PHOTOPATTERNABLE DEPOSITION INHIBITOR CONTAINING SILOXANE |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-09T01%3A39%3A49IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=YANG,%20CHENG&rft.date=2015-07-22&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP2212747B1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |