METHOD OF FORMING DIFFRACTION MIRROR ARRAYS ON A SUBSTRATE FOR MEASUREMENT AND CONTROL OF PHOTOMASK TO SUBSTRATE ALIGNMENT
A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction minor arrays on the substrate, each diffraction minor...
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| creator | MAKI, ANDREW, BENSON GRANADOS, AXEL, AGUADO TIMPANE, TREVOR, JOSEPH FOX, BENJAMIN, AARON GIBBS, NATHANIEL, JAMES |
| description | A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction minor arrays on the substrate, each diffraction minor array of the set of at least three diffraction minor arrays comprising a single row of minors, all mirrors in any particular diffraction minor array spaced apart a same distance, minors in different diffraction minor arrays spaced apart different distances; measuring an intensity of light diffracted from the set of at least three diffraction mirror arrays onto an array of photo detectors; and adjusting a temperature of the photomask or photomask and lens based on the measured intensity of light. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP2206020A2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP2206020A2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP2206020A23</originalsourceid><addsrcrecordid>eNqNjDEKwkAQRdNYiHqHuYAQVrAfk9lkMbsTZidFqhBkrUQDsfL0GrCwtPrweO-vs5cnrbkEtmBZvAsVlM5awUIdB_BOhAVQBPsIH4AQu1NUQaUlAE8YOyFPQQFDCQUHFW6Wv7ZmZY_xDMo_FTauCou_zVbX8Tan3Xc3GVjSot6n6TGkeRov6Z6eA7XG5Mfc5GgOfyhvr9k6Rw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD OF FORMING DIFFRACTION MIRROR ARRAYS ON A SUBSTRATE FOR MEASUREMENT AND CONTROL OF PHOTOMASK TO SUBSTRATE ALIGNMENT</title><source>esp@cenet</source><creator>MAKI, ANDREW, BENSON ; GRANADOS, AXEL, AGUADO ; TIMPANE, TREVOR, JOSEPH ; FOX, BENJAMIN, AARON ; GIBBS, NATHANIEL, JAMES</creator><creatorcontrib>MAKI, ANDREW, BENSON ; GRANADOS, AXEL, AGUADO ; TIMPANE, TREVOR, JOSEPH ; FOX, BENJAMIN, AARON ; GIBBS, NATHANIEL, JAMES</creatorcontrib><description>A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction minor arrays on the substrate, each diffraction minor array of the set of at least three diffraction minor arrays comprising a single row of minors, all mirrors in any particular diffraction minor array spaced apart a same distance, minors in different diffraction minor arrays spaced apart different distances; measuring an intensity of light diffracted from the set of at least three diffraction mirror arrays onto an array of photo detectors; and adjusting a temperature of the photomask or photomask and lens based on the measured intensity of light.</description><language>eng ; fre ; ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2010</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20100714&DB=EPODOC&CC=EP&NR=2206020A2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20100714&DB=EPODOC&CC=EP&NR=2206020A2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MAKI, ANDREW, BENSON</creatorcontrib><creatorcontrib>GRANADOS, AXEL, AGUADO</creatorcontrib><creatorcontrib>TIMPANE, TREVOR, JOSEPH</creatorcontrib><creatorcontrib>FOX, BENJAMIN, AARON</creatorcontrib><creatorcontrib>GIBBS, NATHANIEL, JAMES</creatorcontrib><title>METHOD OF FORMING DIFFRACTION MIRROR ARRAYS ON A SUBSTRATE FOR MEASUREMENT AND CONTROL OF PHOTOMASK TO SUBSTRATE ALIGNMENT</title><description>A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction minor arrays on the substrate, each diffraction minor array of the set of at least three diffraction minor arrays comprising a single row of minors, all mirrors in any particular diffraction minor array spaced apart a same distance, minors in different diffraction minor arrays spaced apart different distances; measuring an intensity of light diffracted from the set of at least three diffraction mirror arrays onto an array of photo detectors; and adjusting a temperature of the photomask or photomask and lens based on the measured intensity of light.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2010</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjDEKwkAQRdNYiHqHuYAQVrAfk9lkMbsTZidFqhBkrUQDsfL0GrCwtPrweO-vs5cnrbkEtmBZvAsVlM5awUIdB_BOhAVQBPsIH4AQu1NUQaUlAE8YOyFPQQFDCQUHFW6Wv7ZmZY_xDMo_FTauCou_zVbX8Tan3Xc3GVjSot6n6TGkeRov6Z6eA7XG5Mfc5GgOfyhvr9k6Rw</recordid><startdate>20100714</startdate><enddate>20100714</enddate><creator>MAKI, ANDREW, BENSON</creator><creator>GRANADOS, AXEL, AGUADO</creator><creator>TIMPANE, TREVOR, JOSEPH</creator><creator>FOX, BENJAMIN, AARON</creator><creator>GIBBS, NATHANIEL, JAMES</creator><scope>EVB</scope></search><sort><creationdate>20100714</creationdate><title>METHOD OF FORMING DIFFRACTION MIRROR ARRAYS ON A SUBSTRATE FOR MEASUREMENT AND CONTROL OF PHOTOMASK TO SUBSTRATE ALIGNMENT</title><author>MAKI, ANDREW, BENSON ; GRANADOS, AXEL, AGUADO ; TIMPANE, TREVOR, JOSEPH ; FOX, BENJAMIN, AARON ; GIBBS, NATHANIEL, JAMES</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP2206020A23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2010</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>MAKI, ANDREW, BENSON</creatorcontrib><creatorcontrib>GRANADOS, AXEL, AGUADO</creatorcontrib><creatorcontrib>TIMPANE, TREVOR, JOSEPH</creatorcontrib><creatorcontrib>FOX, BENJAMIN, AARON</creatorcontrib><creatorcontrib>GIBBS, NATHANIEL, JAMES</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MAKI, ANDREW, BENSON</au><au>GRANADOS, AXEL, AGUADO</au><au>TIMPANE, TREVOR, JOSEPH</au><au>FOX, BENJAMIN, AARON</au><au>GIBBS, NATHANIEL, JAMES</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD OF FORMING DIFFRACTION MIRROR ARRAYS ON A SUBSTRATE FOR MEASUREMENT AND CONTROL OF PHOTOMASK TO SUBSTRATE ALIGNMENT</title><date>2010-07-14</date><risdate>2010</risdate><abstract>A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction minor arrays on the substrate, each diffraction minor array of the set of at least three diffraction minor arrays comprising a single row of minors, all mirrors in any particular diffraction minor array spaced apart a same distance, minors in different diffraction minor arrays spaced apart different distances; measuring an intensity of light diffracted from the set of at least three diffraction mirror arrays onto an array of photo detectors; and adjusting a temperature of the photomask or photomask and lens based on the measured intensity of light.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng ; fre ; ger |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | METHOD OF FORMING DIFFRACTION MIRROR ARRAYS ON A SUBSTRATE FOR MEASUREMENT AND CONTROL OF PHOTOMASK TO SUBSTRATE ALIGNMENT |
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