RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS WITH BASIC DEVELOPMENT ENHANCERS

Radiation-sensitive compositions can be used to prepare positive-working imageable elements useful for example to make lithographic printing plates. The compositions include an aqueous alkaline solvent soluble polymeric binder that includes a phenolic resin (such as a novolak) or a poly(vinyl acetal...

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Bibliographische Detailangaben
Hauptverfasser:	POSTEL, LARISA, RUBIN, MARINA, LEVANON, MOSHE, KURTSER, TANYA
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY LINING MACHINES MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTING PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES STAMPS TRANSPORTING TYPEWRITERS
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Beschreibung
Zusammenfassung:	Radiation-sensitive compositions can be used to prepare positive-working imageable elements useful for example to make lithographic printing plates. The compositions include an aqueous alkaline solvent soluble polymeric binder that includes a phenolic resin (such as a novolak) or a poly(vinyl acetal). The compositions also include a developability-enhancing composition comprising one or more basic nitrogen-containing organic compounds. The radiation-sensitive composition can be coated as an imageable layer that further includes a radiation absorbing compound that is, for example, sensitive to infrared radiation.