LASER GAS INJECTION SYSTEM
A method and apparatus are disclosed which may comprise predicting the gas lifetime for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas may comprise: utilizing at least one of a plurality of laser operating input and/or o...
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| creator | DUNSTAN, Wayne, J O'BRIEN, Kevin, M RATNAM, Aravind JACQUES, Robert, N BESAUCELE, Herve, A RIGGS, Daniel, J |
| description | A method and apparatus are disclosed which may comprise predicting the gas lifetime for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas may comprise: utilizing at least one of a plurality of laser operating input and/or output parameters; utilizing a set of at least one parameter of utilization in the photolithography process to determine a gas use model in relation to the respective input or output parameter; predicting the end of gas life based upon the model and a measurement of the respective input or output parameter. The parameter may comprise a pulse utilization pattern. The method and apparatus may comprise performing gas management for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas comprising: utilizing periodic and frequent partial gas refills comprising an inject comprising a mixture of halogen gas and bulk gas in generally the same ration as the premix ratio provided to the laser in a full gas refill, and in an amount less than two percent of the total gas pressure prior to the injection. |
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The parameter may comprise a pulse utilization pattern. The method and apparatus may comprise performing gas management for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas comprising: utilizing periodic and frequent partial gas refills comprising an inject comprising a mixture of halogen gas and bulk gas in generally the same ration as the premix ratio provided to the laser in a full gas refill, and in an amount less than two percent of the total gas pressure prior to the injection.</description><language>eng ; fre ; ger</language><subject>BASIC ELECTRIC ELEMENTS ; DEVICES USING STIMULATED EMISSION ; ELECTRICITY</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20171227&DB=EPODOC&CC=EP&NR=2115834A4$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20171227&DB=EPODOC&CC=EP&NR=2115834A4$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>DUNSTAN, Wayne, J</creatorcontrib><creatorcontrib>O'BRIEN, Kevin, M</creatorcontrib><creatorcontrib>RATNAM, Aravind</creatorcontrib><creatorcontrib>JACQUES, Robert, N</creatorcontrib><creatorcontrib>BESAUCELE, Herve, A</creatorcontrib><creatorcontrib>RIGGS, Daniel, J</creatorcontrib><title>LASER GAS INJECTION SYSTEM</title><description>A method and apparatus are disclosed which may comprise predicting the gas lifetime for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas may comprise: utilizing at least one of a plurality of laser operating input and/or output parameters; utilizing a set of at least one parameter of utilization in the photolithography process to determine a gas use model in relation to the respective input or output parameter; predicting the end of gas life based upon the model and a measurement of the respective input or output parameter. The parameter may comprise a pulse utilization pattern. The method and apparatus may comprise performing gas management for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas comprising: utilizing periodic and frequent partial gas refills comprising an inject comprising a mixture of halogen gas and bulk gas in generally the same ration as the premix ratio provided to the laser in a full gas refill, and in an amount less than two percent of the total gas pressure prior to the injection.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>DEVICES USING STIMULATED EMISSION</subject><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJDycQx2DVJwdwxW8PTzcnUO8fT3UwiODA5x9eVhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGuAUaGhqYWxiaOJsZEKAEA8gYf2Q</recordid><startdate>20171227</startdate><enddate>20171227</enddate><creator>DUNSTAN, Wayne, J</creator><creator>O'BRIEN, Kevin, M</creator><creator>RATNAM, Aravind</creator><creator>JACQUES, Robert, N</creator><creator>BESAUCELE, Herve, A</creator><creator>RIGGS, Daniel, J</creator><scope>EVB</scope></search><sort><creationdate>20171227</creationdate><title>LASER GAS INJECTION SYSTEM</title><author>DUNSTAN, Wayne, J ; O'BRIEN, Kevin, M ; RATNAM, Aravind ; JACQUES, Robert, N ; BESAUCELE, Herve, A ; RIGGS, Daniel, J</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP2115834A43</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2017</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>DEVICES USING STIMULATED EMISSION</topic><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>DUNSTAN, Wayne, J</creatorcontrib><creatorcontrib>O'BRIEN, Kevin, M</creatorcontrib><creatorcontrib>RATNAM, Aravind</creatorcontrib><creatorcontrib>JACQUES, Robert, N</creatorcontrib><creatorcontrib>BESAUCELE, Herve, A</creatorcontrib><creatorcontrib>RIGGS, Daniel, J</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>DUNSTAN, Wayne, J</au><au>O'BRIEN, Kevin, M</au><au>RATNAM, Aravind</au><au>JACQUES, Robert, N</au><au>BESAUCELE, Herve, A</au><au>RIGGS, Daniel, J</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LASER GAS INJECTION SYSTEM</title><date>2017-12-27</date><risdate>2017</risdate><abstract>A method and apparatus are disclosed which may comprise predicting the gas lifetime for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas may comprise: utilizing at least one of a plurality of laser operating input and/or output parameters; utilizing a set of at least one parameter of utilization in the photolithography process to determine a gas use model in relation to the respective input or output parameter; predicting the end of gas life based upon the model and a measurement of the respective input or output parameter. The parameter may comprise a pulse utilization pattern. The method and apparatus may comprise performing gas management for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas comprising: utilizing periodic and frequent partial gas refills comprising an inject comprising a mixture of halogen gas and bulk gas in generally the same ration as the premix ratio provided to the laser in a full gas refill, and in an amount less than two percent of the total gas pressure prior to the injection.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng ; fre ; ger |
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| subjects | BASIC ELECTRIC ELEMENTS DEVICES USING STIMULATED EMISSION ELECTRICITY |
| title | LASER GAS INJECTION SYSTEM |
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