METHOD FOR MANUFACTURING ACCELERATION SENSOR AND ANGULAR VELOCITY SENSOR BY USING A METHOD FOR CORRECTING MASK PATTERN

The present invention provides a method for correcting a mask pattern used for dry-etching an object to be etched, such as a silicon wafer or the like, with higher accuracy, and also provides a method for readily manufacturing an acceleration sensor and an angular velocity sensor, each having a sign...

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Bibliographische Detailangaben
1. Verfasser:	MORII, AKIO
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GYROSCOPIC INSTRUMENTS HOLOGRAPHY INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT MATERIALS THEREFOR MEASURING MEASURING DISTANCES, LEVELS OR BEARINGS MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION,OR SHOCK NAVIGATION ORIGINALS THEREFOR PHOTOGRAMMETRY OR VIDEOGRAMMETRY PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SURVEYING TESTING
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