METHOD OF TREATING RINSING WASTEWATER FROM DEVELOPING APPARATUS FOR PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE, METHOD OF DEVELOPMENT, AND DEVELOPING APPARATUS
An object of the present invention is to provide a simple method for treatment of a washing waste liquid, which enhances the flocculation effect and also enhances filtration characteristics of a flocculated washing waste liquid in a flocculation treatment of a washing waste liquid generated in proce...
Gespeichert in:
| Hauptverfasser: | , , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; fre ; ger |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | TAKEUCHI, JUN TSURU, HITOSHI YAMAKOSHI, YUKIHIRO |
| description | An object of the present invention is to provide a simple method for treatment of a washing waste liquid, which enhances the flocculation effect and also enhances filtration characteristics of a flocculated washing waste liquid in a flocculation treatment of a washing waste liquid generated in processing a photosensitive lithographic printing plate. Disclosed is a method for treatment of a washing waste liquid generated in a processing apparatus of a photosensitive lithographic printing plate, which comprises (1) adding a cationic polymer flocculant to the washing waste liquid, then (2) adding an anionic polymer flocculant, followed by (3) filtration. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP2096495A4</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP2096495A4</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP2096495A43</originalsourceid><addsrcrecordid>eNqNzbEKwjAQBuAuDqK-wz1ABdEqdDzaSxNok5Ce7ViKxEm0UN_HVzWVgouD0z_cf9-_jF4VsTQ5GAHsCFnpApzS9ZQt1kwtMjkQzlSQU0OlsdMJrUWHfK5BGAdWGjY1hS9WDUGpAlk4tFJlYIP2UW0ZpBi-ezNXkeYYUOc__XW0uPa30W_mXEUgiDO59cOj8-PQX_zdPzuy-116StIjJoc_Km8wb0UN</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD OF TREATING RINSING WASTEWATER FROM DEVELOPING APPARATUS FOR PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE, METHOD OF DEVELOPMENT, AND DEVELOPING APPARATUS</title><source>esp@cenet</source><creator>TAKEUCHI, JUN ; TSURU, HITOSHI ; YAMAKOSHI, YUKIHIRO</creator><creatorcontrib>TAKEUCHI, JUN ; TSURU, HITOSHI ; YAMAKOSHI, YUKIHIRO</creatorcontrib><description>An object of the present invention is to provide a simple method for treatment of a washing waste liquid, which enhances the flocculation effect and also enhances filtration characteristics of a flocculated washing waste liquid in a flocculation treatment of a washing waste liquid generated in processing a photosensitive lithographic printing plate. Disclosed is a method for treatment of a washing waste liquid generated in a processing apparatus of a photosensitive lithographic printing plate, which comprises (1) adding a cationic polymer flocculant to the washing waste liquid, then (2) adding an anionic polymer flocculant, followed by (3) filtration.</description><language>eng ; fre ; ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; METALLURGY ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE</subject><creationdate>2010</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20101229&DB=EPODOC&CC=EP&NR=2096495A4$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25569,76552</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20101229&DB=EPODOC&CC=EP&NR=2096495A4$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TAKEUCHI, JUN</creatorcontrib><creatorcontrib>TSURU, HITOSHI</creatorcontrib><creatorcontrib>YAMAKOSHI, YUKIHIRO</creatorcontrib><title>METHOD OF TREATING RINSING WASTEWATER FROM DEVELOPING APPARATUS FOR PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE, METHOD OF DEVELOPMENT, AND DEVELOPING APPARATUS</title><description>An object of the present invention is to provide a simple method for treatment of a washing waste liquid, which enhances the flocculation effect and also enhances filtration characteristics of a flocculated washing waste liquid in a flocculation treatment of a washing waste liquid generated in processing a photosensitive lithographic printing plate. Disclosed is a method for treatment of a washing waste liquid generated in a processing apparatus of a photosensitive lithographic printing plate, which comprises (1) adding a cationic polymer flocculant to the washing waste liquid, then (2) adding an anionic polymer flocculant, followed by (3) filtration.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2010</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNzbEKwjAQBuAuDqK-wz1ABdEqdDzaSxNok5Ce7ViKxEm0UN_HVzWVgouD0z_cf9-_jF4VsTQ5GAHsCFnpApzS9ZQt1kwtMjkQzlSQU0OlsdMJrUWHfK5BGAdWGjY1hS9WDUGpAlk4tFJlYIP2UW0ZpBi-ezNXkeYYUOc__XW0uPa30W_mXEUgiDO59cOj8-PQX_zdPzuy-116StIjJoc_Km8wb0UN</recordid><startdate>20101229</startdate><enddate>20101229</enddate><creator>TAKEUCHI, JUN</creator><creator>TSURU, HITOSHI</creator><creator>YAMAKOSHI, YUKIHIRO</creator><scope>EVB</scope></search><sort><creationdate>20101229</creationdate><title>METHOD OF TREATING RINSING WASTEWATER FROM DEVELOPING APPARATUS FOR PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE, METHOD OF DEVELOPMENT, AND DEVELOPING APPARATUS</title><author>TAKEUCHI, JUN ; TSURU, HITOSHI ; YAMAKOSHI, YUKIHIRO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP2096495A43</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2010</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE</topic><toplevel>online_resources</toplevel><creatorcontrib>TAKEUCHI, JUN</creatorcontrib><creatorcontrib>TSURU, HITOSHI</creatorcontrib><creatorcontrib>YAMAKOSHI, YUKIHIRO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TAKEUCHI, JUN</au><au>TSURU, HITOSHI</au><au>YAMAKOSHI, YUKIHIRO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD OF TREATING RINSING WASTEWATER FROM DEVELOPING APPARATUS FOR PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE, METHOD OF DEVELOPMENT, AND DEVELOPING APPARATUS</title><date>2010-12-29</date><risdate>2010</risdate><abstract>An object of the present invention is to provide a simple method for treatment of a washing waste liquid, which enhances the flocculation effect and also enhances filtration characteristics of a flocculated washing waste liquid in a flocculation treatment of a washing waste liquid generated in processing a photosensitive lithographic printing plate. Disclosed is a method for treatment of a washing waste liquid generated in a processing apparatus of a photosensitive lithographic printing plate, which comprises (1) adding a cationic polymer flocculant to the washing waste liquid, then (2) adding an anionic polymer flocculant, followed by (3) filtration.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; fre ; ger |
| recordid | cdi_epo_espacenet_EP2096495A4 |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE |
| title | METHOD OF TREATING RINSING WASTEWATER FROM DEVELOPING APPARATUS FOR PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE, METHOD OF DEVELOPMENT, AND DEVELOPING APPARATUS |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-16T11%3A57%3A36IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=TAKEUCHI,%20JUN&rft.date=2010-12-29&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP2096495A4%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |